| 曝光量对计量光栅均匀性的影响 |
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| 引用本文： | 陈赟.曝光量对计量光栅均匀性的影响[J].长春理工大学学报,2005,28(3):117-119. |
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| 作者姓名： | 陈赟 |
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| 作者单位： | 中国科学院长春光学精密机械与物理研究所,长春,130033;中国科学院,研究生院,北京,100039 |
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| 基金项目： | 中国科学院知识创新工程项目 |
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| 摘 要： | 根据光栅的透射特性和曝光及显影机理,对曝光量以及计量光栅线条的黑白比和其均匀性之间的内在关系进行了分析,从理论上给出了曝光量对线条黑白比以及线条黑白比和曝光量对计量光栅均匀性的影响,为提高计量光栅的均匀性给出了理论指导.本文给出了保持曝光量均匀的措施,实验证明,改进后刻制出的计量光栅的均匀性误差较小.
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| 关 键 词： | 计量光栅 曝光量 黑白比 均匀性 |
| 文章编号： | 1672-9870（2005）03-0117-03 |
| 收稿时间： | 2005-02-10 |
| 修稿时间： | 2005年2月10日 |
Influence of Exposure on the Uniformity of Metrology Grating |
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| CHEN Yun.Influence of Exposure on the Uniformity of Metrology Grating[J].Journal of Changchun University of Science and Technology,2005,28(3):117-119. |
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| Authors: | CHEN Yun |
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| Abstract: | According to the transmission property and mechanism of exposure and development of the grating, the internal relations among the exposure quantity and the ratio of black and white of the metrological grating lines as well as its uniformity are analyzed, and the influence of exposure quantity on the ratio of black and white of the metrological grating lines, and the influence of the ratio of black and white of the metrological grating lines and the exposure quantity on the uniformity of the metrological grating are given theoretically, which provides the theoretical instruction for the improvement of uniformity of the metrological grating. The measurement of keeping uniformity of exposure quantity of the metrological grating is also given in this article. Provided by the experiment, the uniformity error of the improved metrological grating is smaller than before. |
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| Keywords: | metrology grating exposure line and space rate uniformity |
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