| 0402片式网络电阻“曼哈顿”现象的分析与改善 |
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| 引用本文： | 赵华斌,周德俭,谢海军,黄营磊.0402片式网络电阻“曼哈顿”现象的分析与改善[J].桂林电子科技大学学报,2012,32(1):45-48. |
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| 作者姓名： | 赵华斌 周德俭 谢海军 黄营磊 |
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| 作者单位： | 1. 桂林电子科技大学机电工程学院,广西桂林,541004
2. 广西工学院机械工程系,广西柳州,545006 |
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| 摘 要： | 针对0402片式网络电阻的“曼哈顿”问题,介绍了“曼哈顿”现象的成因以及主要影响因素,并结合实际生产所遇到0402片式网络电阻的“曼哈顿”问题,从研发及生产工艺方面提出相应的改善和预防措施；在研发阶段,通过修改0402片式网络电阻的焊盘尺寸,在生产阶段通过进一步规范作业要求,使得产品的故障率由0.44％下降到0.04％.
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| 关 键 词： | 0402片式网络电阻 “曼哈顿”现象 表面张力 改善措施 |
Analysis and improvement of Manhattan symptom on 0402 chip network resistors |
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| Zhao Huabin
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Zhou Dejian
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Xie Haijun
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Huang Yinglei.Analysis and improvement of Manhattan symptom on 0402 chip network resistors[J].Journal of Guilin Institute of Electronic Technology,2012,32(1):45-48. |
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| Authors: | Zhao Huabin Zhou Dejian Xie Haijun Huang Yinglei |
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| Affiliation: | 1(1.School of Mechatronic Engineering,Guilin University of Electronic Technology,Guilin 541004,China; 2.Department of Mechanical Engineering,Guangxi University of Technology,Liuzhou 545006,China) |
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| Abstract: | In view of Manhattan symptom on 0402 chip network resistors,the cause of Manhatton phenomenon and main factors were introduced systematically.Combining with production practice,some improving and preventive actions were introduced both R&D work and manufacturring process to resolve the Manhattan phenomenon of 0402 chip network resistors.In the development stages,the footprint dimension of 0402 chip network resistors were modified;work requirements in the production processing were standarded;the failure rate of product decreased from 0.44% to 0.04%. |
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| Keywords: | 0402 chip network resistor Manhattan symptom surface tension improvement action |
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