自组织纳米微结构的制备技术

自组织纳米结构以其新颖的结构特点以及在纳米器件中的潜在用途成为当今纳米技术的研究热点.本文总结评述了国内外关于自组织纳米结构的制备及应用的研究进展.重点总结了低能离子束刻蚀自组织纳米结构的制备技术、表征技术、形成机理和应用探索等方面的研究工作.在单晶半导体材料Si、Ge以及Ⅲ/Ⅴ族化合物等材料表面,利用低能离子束刻蚀可以获得自组织纳米点状结构和自组织纳米条纹结构.总结了低能离子束刻蚀自组织纳米结构的形成与离子束入射角、离子束能量、离子束发散角、气体离子种类、刻蚀时间、衬底温度、加速栅极电压和样品的旋转等参数的关系.评述了低能离子束刻蚀自组织纳米结构的形成机理.展望了相关研究的前景.

The Fabrication of Self-organized Nanostructures

Self-organized nanostructures have many potential applications in nanotechnologies.This novel structure is of great importance in various applications such as the fabrication of functional optical devices.In this paper the preparation and applications of self-organization nanostructure are comprehensively reviewed,and their characterizations and forming mechanism are further summarized.It is observed that the self-organization dots nanostructure and the ripple nanostructure can be obtained by the low-energy ion sputtering on Si,Ge and the Ⅲ/Ⅴsemiconductor surfaces.The key parameters which influence the preparation of nanostructures include the incidence and divergence angle of ion beam,ion beam energy,ion species,erosion time,temperature and rotation of the samples,etc.The relationship between ion-beam parameters and the formation of nanostructures on the surface are also discussed.