| 过渡金属Co与半导体单晶MoS_2 highly edge surface相互作用 |
| |
| 引用本文： | 周黎明,胡永军,林彰达.过渡金属Co与半导体单晶MoS_2 highly edge surface相互作用[J].西安工业学院学报,1987(1). |
| |
| 作者姓名： | 周黎明 胡永军 林彰达 |
| |
| 作者单位： | 西安工业学院物理教研室，中国科学院物理研究所，中国科学院物理研究所 |
| |
| 摘 要： | 本文利用XPS(X—射线光谱)、UPS(紫外光谱)和LEED(低能电子衍射)对过渡金属Co在单晶MoS_2(垂直于B、Z的方向)高边缘密度表面亚原子单层的淀积过程进行了研究。在某亚原子单层淀积以后,MoS:芯态电子向高B、E(结合能)移动0.15ev,价带谱向高B、E移运了0.3ev,而且,在费米能级E_F以下0.8ev处有一新的“肩膀”态出现,且此“肩膀”态随着淀积的增加而增加。作者从物质的电子性质出发对这些实验结果进行了分析。
|
| 关 键 词： | 费米能级 功函数 能带弯曲 表面态 肖特基势垒 加氢脱硫 催化剂 结合能 |
Electronic interaction of Submonolayer Coverage of Transition Metal Cobalt on the Highly Edge Surace of MoS_2 Single Crystal |
| |
| Zhou Liming Hu Yongjun Lin Zhangda.Electronic interaction of Submonolayer Coverage of Transition Metal Cobalt on the Highly Edge Surace of MoS_2 Single Crystal[J].Journal of Xi'an Institute of Technology,1987(1). |
| |
| Authors: | Zhou Liming Hu Yongjun Lin Zhangda |
| |
| Affiliation: | Zhou Liming Hu Yongjun Lin Zhangda |
| |
| Abstract: | UV=Photoelectoron Spectrotcopy (UPS), X=ray Photoelectron Spectroscopy (XPS) and Low Enerhy Electron Diffraction (LEEP) have used to study the submonolayer deposition of transition metal cobalt on the highly edge surface of MoS_2 single crystal.At a certain submonolayer coverage of Co, core level binding energy of MoS_2 and its valence band centroids move to larger binding energies by 0.15 eV and 0.3 eV,respectively. At an energy 0.8 eV, a shoulder state appears wich increases with increasing deposition of Co,These results are analyzed in regard to the electronic properties of the materials. |
| |
| Keywords: | Fermi level work function energy bandbending surface state Schotteky=barrier hydrodesulfurization (HDS) catalyst binding energy |
| 本文献已被 CNKI 等数据库收录！ |
