| 低阻ITO玻璃的制造工艺 |
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| 引用本文： | 杨健君,李军建,张有润,王军,林慧,饶海波,蒋泉,成建波.低阻ITO玻璃的制造工艺[J].电子科技大学学报（自然科学版）,2006,35(2):261-263. |
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| 作者姓名： | 杨健君 李军建 张有润 王军 林慧 饶海波 蒋泉 成建波 |
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| 作者单位： | 1.电子科技大学光电信息学院 成都 610054 |
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| 摘 要： | 有机发光显示器件是目前平板显示中的热点,所用ITO玻璃比液晶显示所用的有更高更严的要求。该文探讨了OLED用ITO玻璃生产的相关工艺,得出使用直流溅射ITO陶瓷靶时,较好的气氛是低氩微氧,功率约200 W左右,溅射时基板温度约250℃,高温无氧退火。得到方阻20Ω以下、平均透过率大于80%的ITO玻璃。
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| 关 键 词： | 氧化铟锡 玻璃 有机发光二极管 |
| 收稿时间： | 2005-09-01 |
| 修稿时间： | 2005-09-01 |
Crafts in ITO Glass for OLED Used |
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| YANG Jian-jun,LI Jun-jian,ZHANG You-run,WANG Jun,LIN Hui,RAO Hai-bo,JIANG Quan,CHENG Jian-bo.Crafts in ITO Glass for OLED Used[J].Journal of University of Electronic Science and Technology of China,2006,35(2):261-263. |
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| Authors: | YANG Jian-jun LI Jun-jian ZHANG You-run WANG Jun LIN Hui RAO Hai-bo JIANG Quan CHENG Jian-bo |
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| Affiliation: | 1.School of Photo-Electronic Information,UEST of China Chengdu 610054 |
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| Abstract: | Low resistivity Indium Tin Oxide (ITO) films were deposited by DC magnetron sputtering using ITO targets. Films deposited at substrate temperature of 250℃ with 200 W input DC power, in an oxygen/argon atmosphere, argon flow was kept at about 16 sccm and the oxygen flow was less than 1sccm, respectively. Annealing of the ITO films without oxygen for 1 h was necessary for achieving low resistivities. Low resistivity (80%) in visible region were found to occur at a high annealing temperature about 350℃. |
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| Keywords: | indium tin oxide glass organic light-emitting diode |
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