| 浅沟槽双光电探测器 |
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| 引用本文： | 陈瑞鹏,毛陆虹,宋瑞良.浅沟槽双光电探测器[J].电子测量技术,2006,29(4):24-25,39. |
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| 作者姓名： | 陈瑞鹏 毛陆虹 宋瑞良 |
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| 作者单位： | 天津大学,天津,300072 |
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| 摘 要： | 提出一种新型光电探测器,采用浅沟槽隔离工艺,在双光电探测器基础上制作而成。通过使用Silvaco公司的器件模拟软件Atlas进行器件模拟,分析了浅沟槽对探测器关键参数的影响,包括响应度和响应速度。结果表明,浅沟槽双光电探测器具有良好的特性,响应度和响应速度都优于双光电探测器。
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| 关 键 词： | 双光电探测器 浅沟槽隔离 器件模拟 响应度 |
Double photo-diodes with STI |
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| Chen Ruipeng,Mao Luhong,Song Ruiliang.Double photo-diodes with STI[J].Electronic Measurement Technology,2006,29(4):24-25,39. |
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| Authors: | Chen Ruipeng Mao Luhong Song Ruiliang |
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| Affiliation: | Tianjin University, Tianjin 300072 |
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| Abstract: | This paper presented a newly double photo-diode (DPD) with shallow trench isolation (STI) process. Some key parameters of the new structured photo detector are analyzed by using device Atlas simulation software of Silvaco company, such as responsibility and response speed. The results indicate that DPD with STI performs very well. The responsibility and response speed are better than DPD. |
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| Keywords: | double photo-diode(DPD) STI device simulation responsibility |
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