Quasi-3D microstructure fabrication technique utilizing hard X-ray lithography of synchrotron radiation |
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Authors: | H Mekaru Y Utsumi T Hattori |
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Affiliation: | (1) Laboratory of Advanced Science and Technology for Industry, Himeji Institute of Technology, 3-1-2 Kamigori, Ako, Hyogo, 678-1205, Japan e-mail: mekaru@lasti.himeji-tech.ac.jp, JP |
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Abstract: | Quasi-three-dimensional (3D) microstructure fabrication technique utilizing hard X-ray lithography (HXL) has been developed.
In this technique, as the intensity distribution of the X-rays is controlled by a newly developed bending mirror, the exposure
residual depth of polymethyl methacrylate (PMMA) resist is controlled over the exposed area. The maximum difference of depths
was approximately 50 μm over the large area more than 60 mm (horizontal) × 5 mm (vertical). We also investigated the effects
of controlling the beam intensity distribution for exposure changing X-ray mask absorber shapes and angle on the obtained
quasi-3D resist pattern shapes. As the results, Quasi-3D PMMA patterns with inclined shape sidewall and graded depths were
successfully fabricated. We believe this technique greatly expands applications of LIGA process.
Received: 10 August 2001/Accepted: 24 September 2001
This paper was presented at the Fourth International Workshop on High Aspect Ratio Microstructure Technology HARMST 2001
in June 2001. |
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