| 光刻机工件台控制系统设计 |
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| 引用本文： | 李聪,刘杨,王公峰.光刻机工件台控制系统设计[J].自动化技术与应用,2012,31(10):25-30. |
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| 作者姓名： | 李聪 刘杨 王公峰 |
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| 作者单位： | 哈尔滨工业大学控制科学与工程系,黑龙江哈尔滨,150001 |
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| 基金项目： | 基金项目：国家自然科学基金（编号61174037） |
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| 摘 要： | 本文针对光刻机工件台技术中所要求的指标,建立了系统的电机模型,设计出终端控制系统,采用三环控制策略,并进行了宏动跟微动的控制策略仿真,并且分析了控制系统的误差,在实际应用中取得了很好的效果。
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| 关 键 词： | 光刻机工件台 误差分析 状态反馈 |
The Design of Control System in Lithography Wafer Stage |
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| LI Cong
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LIU Yang
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WANG Gong-feng.The Design of Control System in Lithography Wafer Stage[J].Techniques of Automation and Applications,2012,31(10):25-30. |
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| Authors: | LI Cong LIU Yang WANG Gong-feng |
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| Affiliation: | ( Department of Control Science and Engineering, Harbin Institute of Technology, Harbin 150001 China ) |
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| Abstract: | To satisfy the requirements of control system in space optical communication, a motor model of the system is established, a control system with three-levels strategy is proposed in this paper. The macro and micro control strategy simuliation is proceeded, Error of the control system is analyzed. The proposed is approach is proved to be reasonable in the application. |
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| Keywords: | lithography wafer stage error analysis state feedback |
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