| 粉尘等离子体的研究 |
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| 引用本文： | 尹盛,赵亮,李战春,王敬义.粉尘等离子体的研究[J].中国材料科技与设备,2008,5(1):37-39. |
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| 作者姓名： | 尹盛 赵亮 李战春 王敬义 |
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| 作者单位： | [1]华中科技大学电子科学与技术系,湖北武汉430074 [2]华中科技大学网络与计算中心,湖北武汉430074 |
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| 基金项目： | 国家自然科学基金资助项目（10475029） |
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| 摘 要： | 在实验和理论上研究了粉粒在等离子体鞘区的沉降、带电、收集和刻蚀。基于粉尘对等离子区电子能量分布函数的影响，讨论了粉尘对等离子体的干扰。有关结果表明等离子体对硅粉的纯化处理有可能应用于将工业硅直接制成太阳级硅。
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| 关 键 词： | 硅粉纯化 等离子体稳定性 刻蚀速率 太阳级硅 |
Study on Particulate Plasma |
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| YIN Sheng, ZHAO Liang, LI Zhan-chun, WANG Jing-yi.Study on Particulate Plasma[J].Chinese Materials Science Technology & Equipment,2008,5(1):37-39. |
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| Authors: | YIN Sheng ZHAO Liang LI Zhan-chun WANG Jing-yi |
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| Affiliation: | YIN Sheng, ZHAO Liang, LI Zhan-chun, WANG Jing-yi(1. Department of Electronic Science and Technology, Huazhong University of Science and Technology, Hubei, Wuhan,430074 ,China 2. Center of Network and Calculation, Huazhong University of Science and Technology, Hubei,Wuhan,430074 ,China) |
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| Abstract: | The drop, charges, collecting and etching of the particulate were studied in the fields of test and theory. Based on the influence of the particulates on electron energy distribution function in the plasma area, the disturbed effects of plasma due to particulates were discussed. The results show that the plasma treatment for Si-powder purity could be used in the SOG-Si manufacture from industry silicon directly. |
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| Keywords: | Si-powder purity Plasma stability Etching rate SOG- Si |
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