| 射频磁控溅射法制备TiB2涂层及其性能分析 |
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| 引用本文： | 孙荣幸,张同俊,戴伟,李松.射频磁控溅射法制备TiB2涂层及其性能分析[J].材料科学与工程学报,2006,24(2):249-252. |
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| 作者姓名： | 孙荣幸 张同俊 戴伟 李松 |
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| 作者单位： | 华中科技大学模具技术国家重点实验室,湖北,武汉,430074 |
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| 基金项目： | 广东省东莞市科技局科研项目 |
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| 摘 要： | 利用射频磁控溅射技术在硅和钢片上沉积了TiB2涂层.采用场发射电子扫描显微镜(FESEM),小掠射角x射线衍射(GAXRD)及X射线光电子能谱(XPS)分别研究了涂层的横截面形貌,晶体结构以及涂层中的元素和化学状态.同时,对涂层的显微硬度和残余应力进行了表征.结果表明, 利用射频磁控溅射法制备的TiB2涂层平整光滑,结构致密,沿001]晶向择优生长,具有纳米晶结构,硬度显著提高,而且残余压应力较低.
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| 关 键 词： | 射频磁控溅射 TiB2涂层 GAXRD 残余应力 射频磁控溅射 法制 涂层 性能分析 Magnetron Sputtering Coatings Analyse 残余压应力 显微硬度 晶结构 纳米 择优生长 晶向 结果 表征 残余应力 化学状态 元素 晶体结构 截面形貌 |
| 文章编号： | 1673-2812(2006)02-0249-04 |
| 修稿时间： | 2005年7月18日 |
Properties Analyse of TiB2 Coatings Deposited by Radio-frequency Magnetron Sputtering |
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| SUN Rong-xing,ZHANG Tong-jun,DAI Wei,LI Song.Properties Analyse of TiB2 Coatings Deposited by Radio-frequency Magnetron Sputtering[J].Journal of Materials Science and Engineering,2006,24(2):249-252. |
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| Authors: | SUN Rong-xing ZHANG Tong-jun DAI Wei LI Song |
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| Abstract: | TiB_2 coatings were prepared by radio-frequency magnetron sputtering technique on the substrates of steel and silicon.The cross-section morphology, microstructure as well as the compositions and chemical states of the coatings obtained were characterized by field emission scanning electron microscopy,glancing angle X-ray diffraction and X-ray photoelectron spectroscopy,respectively. It was found that the TiB_2 coatings show a smooth surface and dense nanostructure with a preferential crystalline orientation of().The micro-hardness and residual stresses of the films were also examined.It was found that the microhardness of the coatings obtained is considerably higher than the substrates,while the compressive residual stress of the film is significantly low. |
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| Keywords: | radio-frequency magnetron sputtering TiB_2 coating GAXRD residual stress |
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