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Contact size-dependent switching instabilities in HfO2 RRAM
Authors:Baikov  Pavel  Ranganathan  Kamalakannan  Goldfarb  Ilan  Ruzin  Arie
Affiliation:1.Department of Physical Electronics, Faculty of Engineering, Tel-Aviv University, 69978, Tel Aviv, Israel
;2.Department of Materials Science and Engineering, Faculty of Engineering, Tel-Aviv University, 69978, Tel Aviv, Israel
;
Abstract:Journal of Materials Science: Materials in Electronics - A comprehensive understanding of the resistive switching mechanisms that activate REDOX-based random access memory devices is necessary to...
Keywords:
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