Influence of oxygen flow rate on photocatalytic TiO2 films deposited by rf magnetron sputtering |
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| Authors: | A H Chiou C G Kuo C H Huang W F Wu C P Chou C Y Hsu |
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| Affiliation: | (1) Department of Mechanical Engineering, National Chiao Tung University, Hsinchu, Taiwan, ROC;(2) Department of Industrial Education, National Taiwan Normal University, Taipei, Taiwan, ROC;(3) Department of Mechanical Engineering, Lunghwa University of Science and Technology, Taoyuan, Taiwan, ROC;(4) National Nano Device Laboratories, No. 26, Zhanye 1st Rd., East Dist., Hsinchu, Taiwan, ROC; |
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| Abstract: | Titanium dioxide (TiO2) thin films having anatase (1 0 1) crystal structure were prepared on non-alkali glass substrates by rf (13.56 MHz) magnetron
sputtering using a TiO2 ceramic target under various oxygen partial pressures. At a fixed substrate temperature of 400 °C and total gas pressure
of 1 Pa after 3 h deposition. Effects of oxygen partial pressure on the structural, surface morphology, and photocatalytic
activities of the TiO2 thin films were investigated. We performed both photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity
under UV light illumination. The XRD patterns exhibited a broad-hump shape indicating the amorphous structure of TiO2 thin films. The results showed that when the O2/(Ar + O2)] flow rate increased to 50%, the photoinduced decomposition of MB and photoinduced hydrophilicity were enhanced. The water
contact angle after 9 min UV illumination was approximately 4.5°, and the methylene blue (MB) solution decomposition from
12 down to 3.34 μ mol/L for 240 min UV irradiation. |
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