| Cu/Zr纳米多层膜微结构与力学性能 |
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| 引用本文： | 苑永涛,方敬忠,刘红,陈志强.Cu/Zr纳米多层膜微结构与力学性能[J].光电工程,2008,35(10):17-20. |
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| 作者姓名： | 苑永涛 方敬忠 刘红 陈志强 |
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| 作者单位： | 中国科学院光电技术研究所,成都,610209 |
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| 摘 要： | 本文利用直流磁控溅射方法在石英玻璃基片上制备一系列自支撑Cu/Zr纳米多层膜,使用箱式电炉对多层膜进行退火处理,利用显微硬度计,X射线衍射仪、扫描探针显微镜表征了多层膜的力学性能与微观结构,研究了不同工艺参数对纳米多层膜性能的影响.研究结果表明:当Cu调制层厚从42 nm增加至140nm时,多层膜显微硬度从4.9 GPa逐渐降低至4.0 GPa;当Zr调制层厚从3.2 nm增加至4.8 nm时,显微硬度值从6.51 GPa降低至5.64 GPa,硬度值降低13.4%,而从4.8 nm增至8 nm时,显微硬度值变化不大(约5.7 GPa);合适的温度退火时,多层膜微观缺陷消失,表面形貌更均匀,显微硬度增加.利用Chu和Barnett提出的硬度增强理论模型对Cu/Zr纳米多层膜表现出的超硬现象进行了理论分析和解释.
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| 关 键 词： | 磁控溅射 纳米多层膜 显微硬度 退火 |
| 收稿时间： | 2008/4/25 |
Microstructure and Mechanical Performance of Cu/Zr Nano-multilayer Films |
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| YUAN Yong-tao,FANG Jing-zhong,LIU Hong,CHEN Zhi-qiang.Microstructure and Mechanical Performance of Cu/Zr Nano-multilayer Films[J].Opto-Electronic Engineering,2008,35(10):17-20. |
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| Authors: | YUAN Yong-tao FANG Jing-zhong LIU Hong CHEN Zhi-qiang |
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| Affiliation: | YUAN Yong-tao,FANG Jing-zhong,LIU Hong,CHEN Zhi-qiang(Institute of Optics , Electronics,Chinese Academy of Sciences,Chengdu 610209,China) |
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| Abstract: | Cu/Zr nano-multilayer films are prepared by Direct Current(DC) magnetron sputtering in the silex substrate,and the box-type furnace is used to anneal.Micro-sclerometer,X-ray Diffractometer(XRD) and Scanning Probe Microscope(SPM) are used to analyze the mechanical performance and microstructure of Cu/Zr nano-multilayer films.The relation of process parameters and performance is investigated.Results show that:When Cu modulation thickness varies between 42 nm and 140 nm,the microhardness of Cu/Zr nano-multilay... |
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| Keywords: | magnetron-sputtering nano-multilayer films microhardness annealing |
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