| 银离子掺杂TiO2薄膜的物理性能研究 |
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| 引用本文： | 刘恩庆,王向晖,胡石琼,陈静.银离子掺杂TiO2薄膜的物理性能研究[J].功能材料与器件学报,2006,12(6):474-478,488. |
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| 作者姓名： | 刘恩庆 王向晖 胡石琼 陈静 |
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| 作者单位： | 1. 华东师范大学光谱学与波谱学教育部重点实验室,上海,200062
2. 中国科学院上海微系统及信息研究所,上海,200050 |
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| 基金项目： | 国家自然科学基金
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教育部留学回国人员科研启动基金 |
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| 摘 要： | 不同剂量的银离子被注入到采用反应磁控溅射(RMS)制备出的TiO2薄膜中.实验发现,薄膜的成分以二氧化钛和单质银为主,薄膜中可以看到银的纳米晶颗粒.注入的银离子在薄膜中呈近高斯分布,分布峰随注入剂量的增加而向表层移动.银离子注入后原本致密平整的TiO2薄膜表面出现了沟壑和晶粒粗化现象,且均方根粗糙度随注入剂量的增加而增加.不同的注入剂量对薄膜的表面能没有明显的影响.
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| 关 键 词： | 离子注入 反应磁控溅射 二氧化钛 银 显微结构 |
| 文章编号： | 1007-4252（2006）06-474-05 |
| 收稿时间： | 2005-11-09 |
| 修稿时间： | 2005-11-092006-02-22 |
Physical and chemical characterizations of Ag doped titanium dioxide films |
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| LIU En-qing,WANG Xiang-hui,HU Shi-qiong,CHEN Jing.Physical and chemical characterizations of Ag doped titanium dioxide films[J].Journal of Functional Materials and Devices,2006,12(6):474-478,488. |
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| Authors: | LIU En-qing WANG Xiang-hui HU Shi-qiong CHEN Jing |
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| Affiliation: | 1. East China Normal University, Key Laboratory for Optical and Magnetic Resonance Spectroscopy, Shanghai 200062, China ;2. Shanghai Institute of Micro - system and Information Technology, Chinese Academy of Sciences ,Shanghai 200050, China |
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| Abstract: | Ag~+ was implanted into titanium dioxide films that synthesized by reactive magnetron sputtering method.The investigation results show that main phases in the film are TiO_2 and Ag,and Ag nano particles can be found.The depth profile distribution of Ag closes to Gauss Distribution,and its peak moves to the surface of the film with the increase of Ag doped dose.After Ag implantation,rough surface with bulky islands are observed instead of originally flat and dense surface,and the root mean squared(RMS)roughness of the film increases with implantation dose.However,different implantation dose has no significant influence on the surface energy of the films. |
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| Keywords: | ion implantation reactive magnetron sputtering titanium dioxide silver microstrueture |
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