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Preparation of (001) preferentially oriented titanium thin films by ion-beam sputtering deposition on thermal silicon dioxide
Authors:Imrich Gablech  Vojtěch Svatoš  Ondřej Caha  Miloš Hrabovský  Jan Prášek  Jaromír Hubálek  Tomáš Šikola
Affiliation:1. Central European Institute of Technology, Brno University of Technology, Technická 3058/10, 61600, Brno, Czech Republic
2. Department of Microelectronics, Faculty of Electrical Engineering and Communication, Brno University of Technology, Technická 3058/10, 61600, Brno, Czech Republic
3. Central European Institute of Technology, Masaryk University, Kamenice 753/5, 62500, Brno, Czech Republic
4. Department of Condensed Matter Physics, Faculty of Science, Masaryk University, Kotlá?ská 2, 60200, Brno, Czech Republic
5. Institute of Physical Engineering, Brno University of Technology, Technická 2896/2, 61669, Brno, Czech Republic
Abstract:
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