金刚石薄膜的性质、制备及应用

金刚石有着优异的物理化学性质，化学气相沉积金刚石薄膜的研究受到研究人员和工业界的广泛关注。通过评述金刚石薄膜的性质、制备方法及应用等方面的研究成果，着重阐述化学气相沉积金刚石薄膜技术的基本原理，分析了各种沉积技术的优、缺点。结合对金刚石薄膜应用的讨论，分析了金刚石薄膜在工业应用中存在的问题和制备技术的发展方向。分析结果表明：MWCVD法是高速率、高质量、大面积沉积金刚石薄膜的首选方法；而提高金刚石的生长速度、降低生产成本等是进一步开发刚石薄膜工业化应用所需解决的主要问题。

THE PROPERTIES,PRODUCTION AND APPLICATIONS OF DIAMOND THIN FI

Diamond has some of the most extreme physical properties of any materials. Recent advances in the chemical vapor deposition of diamond thin films have aroused great interest in researchers and industry. The article summarizes the properties, methods of production and application prospects of diamond thin films, briefly explaining the basic science and technology underlying the chemical vapor deposition of diamond thin films. The advantages and disadvantages the main kinds of deposition methods are mentioned. Important areas for further research and development of CVD diamond are presented. Microwave CVD (MWCVD) is one promising method for high growth rate, high quality, and large area diamond deposition. Developing methods to scale up the CVD processes and reduce production cost to the point at which it becomes economically viable to provide diamond for applications is the current emphasis of researchers and industry.