脉冲电沉积工艺对镍镀层结构与硬度的影响

为了优化脉冲电镀镍工艺,采用扫描电子显微镜、X射线衍射仪和显微硬度仪研究了脉宽、脉间、峰电流密度对镀层的晶粒尺寸、表面形貌、晶体取向和硬度的影响.结果表明,保持峰电流密度和脉间不变,镀层的晶粒尺寸随着脉宽的增加先减小后增加.当脉宽由0.1ms增至8ms,晶体取向由(111)织构向(200)织构转变.保持峰电流密度和脉宽不变,当脉间的增加,晶粒尺寸增大,但晶体的取向不变.增加峰电流密度能够显著降低镀层的晶粒尺寸.当峰电流密度由0.2A/cm2增至2.0A/cm2,晶体取向由随机态向强的(200)织构转变.镀层的硬度与镀层的晶粒尺寸有关,晶粒尺寸较大时,服从Hall-Petch关系,晶粒尺寸较小时,产生纳米效应,反Hall-Petch关系.因此,脉宽、脉间、峰电流密度均能显著影响镀层的显微硬度.

Influence of pulse parameters on the microstructure and microhardness of nickel electrodeposits

To optimize the nickel pulse plating process,the scanning electron microscope,X-ray diffraction and microhardness tester were used to determine the influence of pulse on-time,pulse off-time and peak current density on the grain size,surface morphology,crystal orientation and microhardness of the nickel electrodeposits. The study shows that at constant off-time and peak current density,the crystal size of the deposits initially decreases and then starts to increase with the increasing pulse on-time. The crys...