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脉冲激光沉积法生长In掺杂SrTiO3薄膜及其微观结构研究
引用本文:张亦文,李效民,赵俊亮,于伟东,高相东,吴峰.脉冲激光沉积法生长In掺杂SrTiO3薄膜及其微观结构研究[J].无机材料学报,2008,23(3):531-534.
作者姓名:张亦文  李效民  赵俊亮  于伟东  高相东  吴峰
作者单位:1. 中国科学院,上海硅酸盐研究所,高性能陶瓷和超微结构国家重点实验室,上海,200050;中国科学院,研究生院,北京,100049
2. 中国科学院,上海硅酸盐研究所,高性能陶瓷和超微结构国家重点实验室,上海,200050
基金项目:国家重点基础研究发展计划(973计划) , 国家自然科学基金
摘    要:采用脉冲激光沉积(PLD)方法在MgO/TiN/Si(100)衬底上,生长不同In掺杂量的SrInxTi1-xO3(x=0、0.1、0.2)薄膜,研究In掺杂及本征SrTiO3(STO)缓冲层对薄膜结晶性能,表面形貌、生长模式及紫外拉曼光谱特性的影响.结果表明,In掺杂导致薄膜结晶度降低,通过引入本征STO缓冲层可有效提高In掺杂STO薄膜的结晶度,增强薄膜的(200)择优取向性.然而随In掺杂量的增加,薄膜表面平均粗糙度增大;生长模式由层状生长转变为岛状-层状复合模式;拉曼一次声子振动模式峰强逐渐增强,说明薄膜的晶体对称性降低.

关 键 词:脉冲激光沉积法  SrTiO3薄膜  缓冲层  结晶度  脉冲激光沉积法  生长转变  掺杂量  薄膜表面  微观  结构研究  Pulsed  Laser  Deposition  Films  doped  Indium  Structural  Properties  晶体对称性  逐渐增强  振动模式  声子  紫外拉曼  复合模式  岛状  平均粗糙度  取向性
文章编号:1000-324X(2008)03-0531-04
收稿时间:2007-5-25
修稿时间:2007年5月25日

Growth and Structural Properties of Indium doped SrTiO3 Films by Pulsed Laser Deposition
ZHANG Yi-Wen,LI Xiao-Min,ZHAO Jun-Liang,YU Wei-Dong,GAO Xiang-Dong,WU Feng.Growth and Structural Properties of Indium doped SrTiO3 Films by Pulsed Laser Deposition[J].Journal of Inorganic Materials,2008,23(3):531-534.
Authors:ZHANG Yi-Wen  LI Xiao-Min  ZHAO Jun-Liang  YU Wei-Dong  GAO Xiang-Dong  WU Feng
Affiliation:(1.StateKeyLaboratoryofHighPerformanceCeramicsandSuperfineMicrostructure,ShanghaiInstituteofCeramics,ChineseAcademyofSciences,Shanghai200050,China;2.GraduateUniversityoftheChineseAcademyofSciences,Beijing100049,China)
Abstract:Undoped and In-doped SrTiO3(STO) films were grown on MgO/TiN/Si(100) substrates by pulsed laser deposition(PLD). The growth mechanism, crystallinity, surface morphology, and UV-Raman spectra of the films were studied. Results indicate that undoped STO films show high quality crystalline structure with highly (200) orientation. With Indium doping, the crystallinity of the STO film deteriorate, the first order Raman peaks increase indicating the breaking of crystal symmetry, and the film growth mode change from the layer-by-layer mode to island-layer mixed one, resulting in the roughening of the film surface. Furthermore, the crystallinity and (200) orientation of In-doped STO film can be enhanced significantly by introducing an undoped STO buffer layer.
Keywords:pulsed laser deposition  SrTiO3 film  buffer layer  crystallinity
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