稀土化合物浆料对CVD金刚石厚膜的刻蚀

ＣＶＤ金刚石厚膜具有极高的硬度，使得对其进行表面抛光极为困难．传统的机械抛光方法既不经济又耗费时间，而一些新的抛光技术又由于实验条件限制而难以推广．针对以上情况，我们寻求到一种新的化学刻蚀方法，即利用稀土化合物浆料对金刚石厚膜生长表面进行刻蚀，破坏表面的晶粒使之成为晶骸，降低表面的耐磨性，以提高表面粗糙的金刚石厚膜的抛光效率．

Etching of CVD Diamond Thick Films by Rare-earth Compound Ink

CVD diamond with high electrical, optical and thermal quality has been used in many applications. However, its inert chemical nature and high temperature stability make it difficult to be processed. A highly available etching technique compatible with existing diamond processing is desirable. In this paper, CVD diamond thick films were etched with rare-earth compound ink prepared by the authors. The etching process is taken in the atmosphere at a temperature below the oxidation temperature of diamond. The technique uses inexpensive and safe rare-earth compound ink and the experimental results show that the processing is simple and efficient for polishing the CVD diamond thick films rapidly. The results were studied by SEM.