偏压对磁控溅射沉积Al—Zn镀层成分和结构的影响 |
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引用本文: | 鲜晓斌,吕学超,张永彬.偏压对磁控溅射沉积Al—Zn镀层成分和结构的影响[J].真空,2001(6):20-22. |
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作者姓名: | 鲜晓斌 吕学超 张永彬 |
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作者单位: | 中国工程物理研究院,四川,绵阳,621900 |
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摘 要: | 采用扫描电镜(SEM)、X射线衍射仪、X射线能谱(EDS)和俄歇电子能谱仪(AES),研究了基片偏压对磁控溅射沉积Al-Zn镀层组成和结构的影响。随着基片偏压的增加镀层的Zn含量呈降低趋势,在不同基片偏压下可获得不同择优取向的Al-Zn镀层。
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关 键 词: | 基片偏压 Al-Zn镀层 组成 结构 磁控溅射 金属材料 表面处理 铝-锌镀层 |
文章编号: | 1002-0322(2001)06-0020-03 |
修稿时间: | 2001年4月24日 |
Influence of substrate bias on the composition and structure of sputtered Al-Zn coating |
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Abstract: | The coatings were sputtered from target of Al Zn alloys onto steel substrates, over a different of bias voltages. The composition, structure, and morphology of coatings were characterised by energy dispersive X-ray spectrometry, X ray diffraction, Auger electron spectroscopy, and scanning electron microscopy respectively. The composition of the deposited films were highly dependent on the substrate bias. During the growth of the coatings energetic ion bombardment significantly affected the coatings prefered orientation. |
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Keywords: | substrate bias Al Zn coatings composition structure |
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