| 离子源对磁控溅射制备TiNC膜基结合力的影响 |
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| 引用本文： | 钱锋,林晶,刘树红.离子源对磁控溅射制备TiNC膜基结合力的影响[J].真空,2012,49(1):78-82. |
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| 作者姓名： | 钱锋 林晶 刘树红 |
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| 作者单位： | 1. 深圳市天星达真空镀膜设备有限公司,广东深圳,518172
2. 深圳市天星达真空镀膜设备有限公司,广东深圳518172;哈尔滨商业大学,黑龙江哈尔滨150028 |
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| 摘 要： | 由于膜基附着力不好,膜层脱落问题是工业生产中磁控溅射镀制黑膜最常见的问题.本实验采用 阳极线性离子源和霍尔点源辅助磁控溅射复合技术制备了TiNC薄膜,探讨解决TiNC膜基附着力不好的问题.初步实验结果表明,离子束辅助沉积对于改善膜基附着力的作用并不明显,本文还比较了脉冲偏压清洗对膜基附着力的影响,探讨了其可能影响因素.
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| 关 键 词： | 阳极层离子源 膜基附着力 TiNC 中频磁控溅射 |
Influence of ion source on the film adhesion of TiNC prepared by magnetron sputtering |
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| QIAN Feng
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LIN Jing
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LIU Shu-hong.Influence of ion source on the film adhesion of TiNC prepared by magnetron sputtering[J].Vacuum,2012,49(1):78-82. |
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| Authors: | QIAN Feng LIN Jing LIU Shu-hong |
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| Affiliation: | 1(1.Shenzhen Tenstar Vacuum Co.LTD,Shenzhen 518172,China; 2.Harbin University of Commerce,Harbin 150028,China) |
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| Abstract: | Poor film adhesion is one of the most common problems in film deposition by magnetron sputtering,especially for black decoration coating.In this paper,TiNC films were prepared by magnetron sputtering assisted by ion sources to improve the film adhesion.However,the experiment shows that the influence of ion sources on the improvement of film adhesion is not obvious.Moreover,the effect of pulse bias cleaning on the film adhesion and the reason is discussed in details. |
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| Keywords: | anode linear ion source film adhesion TiNC MF magnetron sputtering |
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