| 电沉积Ni—P非昌态合金的初期结构及形成机理 |
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| 引用本文： | 于维平,段淑贞.电沉积Ni—P非昌态合金的初期结构及形成机理[J].材料研究学报,1996,10(4):419-422. |
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| 作者姓名： | 于维平 段淑贞 |
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| 作者单位： | [1]北京航空航天大学 [2]北京科技大学 |
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| 基金项目： | 国家自然科学基金;;冶金部腐蚀－磨蚀与表面技术开放实验室项目 |
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| 摘 要： | 在典型的用于电沉积Ｎｉ－Ｐ非晶态合金的溶液中，于非晶碳膜上恒电位「－９０００ｍＶ（ＳＣＥ）电沉积ｌｓ后，发现有Ｎｉ的晶核形成，在相邻很近的Ｎｉ晶核之间沉积出Ｎｉ－Ｐ＝Ｓ非晶主不连非晶镀层，证明电 Ｎｉ－Ｐ合金初期态Ｎｉ的形成并非基体外延所致。
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| 关 键 词： | 电沉积 初期结构 镍磷合金 |
| 收稿时间： | 1996-08-25 |
| 修稿时间： | 1996-08-25 |
INITIAL STRUCTURE OF ELECTODEPOSTING Ni-P AMORPHOUS ALLOY AND ITS FORMATION MECHANISM |
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| YU WeipingDUAN Shuzhen.INITIAL STRUCTURE OF ELECTODEPOSTING Ni-P AMORPHOUS ALLOY AND ITS FORMATION MECHANISM[J].Chinese Journal of Materials Research,1996,10(4):419-422. |
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| Authors: | YU WeipingDUAN Shuzhen |
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| Affiliation: | YU Weiping(Beijing University of Aeronautics and Astronautics)DUAN Shuzhen(University of Science and Technology Beijing)(Correspondent:Assistant Professor,Beijing University of Aeronautics and Astronautics,Beijing ) |
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| Abstract: | Electrodeposition was carried out on an amorphous carbon film at potential -900 mV(SCE)for 1s in a typical bath for plating Ni-P alloy. It was shown that many crystal Ni nuclei formed on the amorphous carbon film and the discontinuous amorphous film and |
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| Keywords: | amorphous alloy electrodeposition initial structure |
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