| 超高真空磁控溅射法沉积铀薄膜及其表面状态 |
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| 引用本文： | 陈秋云,赖新春,黄火根,罗丽珠,蒋春丽,谭世勇.超高真空磁控溅射法沉积铀薄膜及其表面状态[J].材料保护,2009,42(12). |
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| 作者姓名： | 陈秋云 赖新春 黄火根 罗丽珠 蒋春丽 谭世勇 |
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| 作者单位： | 表面物理与化学国家重点实验室,四川,绵阳,621907 |
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| 摘 要： | 铀薄膜有助于原子参数的测试研究,目前对铀薄膜研究的报道较少.利用超高真空磁控溅射法在单晶Si片上制备了铀薄膜.通过扫描电子显微镜(SEM)对铀薄膜的表面形貌进行了观察,利用X射线光电子能谱仪(XPS)及X射线衍射仪(XRD)对铀薄膜的表面结构及元素状态进行了分析和表征.结果表明:铀薄膜呈片状式生长,比较致密、连续,表面由铀及氧化铀组成,之下为纯铀.
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| 关 键 词： | 磁控溅射 铀薄膜 膜表面状态 |
Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization |
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| CHEN Qiu-yun,LAI Xin-chun,HUANG Huo-gen,LUO Li-zhu,JIANG Chun-li,TAN Shi-yong.Preparation of Uranium Film by Ultra High Vacuum Magnetron Sputtering and Its Characterization[J].Journal of Materials Protection,2009,42(12). |
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| Authors: | CHEN Qiu-yun LAI Xin-chun HUANG Huo-gen LUO Li-zhu JIANG Chun-li TAN Shi-yong |
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| Affiliation: | CHEN Qiu-yun,LAI Xin-chun,HUANG Huo-gen,LUO Li-zhu,JLANC Chun-li,TAN Shi-yong(State Key Laboratory for Surface Physics , Chemistry,Mianyang 621907,China) |
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| Abstract: | Uranium film was prepared on the surface of single crystal silicon wafer by using ul-tra high vacuum magnetron sputtering.The surface morphology of the resulting uranium film was observed using a scanning electron microscope.The surface chemical state and phase structure of the film were analyzed by means of X-ray photoelectron spectroscopy and X-ray diffraction.Results show that the as-prepared uranium film is flake-like,compact and continuous.The surface of the film is composed of elemental U and uranium ... |
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| Keywords: | magnetron sputtering uranium film surface morphology |
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