首页 | 本学科首页   官方微博 | 高级检索  
     

电流密度和添加剂对镁合金电化学磷化膜耐蚀性的影响
引用本文:孙雅茹,苏晓贺.电流密度和添加剂对镁合金电化学磷化膜耐蚀性的影响[J].材料保护,2011,44(11):42-44,8.
作者姓名:孙雅茹  苏晓贺
作者单位:沈阳工业大学理学院,辽宁沈阳,110870
摘    要:电化学磷化可以快速获得磷化膜,提高镁合金的耐蚀性,目前就电化学磷化工艺条件对膜层的影响研究尚不深入。为此,采用扫描电镜和电化学方法研究了电流密度和添加剂对镁合金电化学磷化膜耐蚀性的影响。结果显示:电流密度为4.oA/din。时基础磷化液中所得磷化膜表面致密均匀,具有良好的耐蚀性;以0.5g/L酒石酸和5.Og/L磷酸二...

关 键 词:镁合金  电化学磷化  耐蚀性  电流密度  添加剂  电化学方法

Effects of Current Density and Additives on Corrosion Resistance of Phosphating Coating Prepared on Magnesium Alloy via Electrochemical Route
SUN Ya-ru,SU Xiao-he.Effects of Current Density and Additives on Corrosion Resistance of Phosphating Coating Prepared on Magnesium Alloy via Electrochemical Route[J].Journal of Materials Protection,2011,44(11):42-44,8.
Authors:SUN Ya-ru  SU Xiao-he
Affiliation:(School of Science,Shenyang University of Technology,Shengyang 110870,China).
Abstract:Phosphating coating was prepared on Mg alloy substrate using an electrochemical phosphating route. The effects of current density and additives on the corrosion resistance of as - obtained phosphating coating were investigated using a scanning electron microscope and an electrochemical test rig.Results show that phosphating coating with compact and uniform surface structure as well as good corrosion resistance can be prepared on Mg alloy substrate by electrochemical phosphating in regular phosphating solution at a current density of 4.0 A/dm~2. Introducing 0.5 g/L tartaric acid and 5.0 g/L sodium dihydrogen phosphate into regular phosphating solution contributed to the accelerated growth of electrochemical phosphating coating on Mg alloy surface and improvement of the compactness and corrosion resistance of the phosphating coating.
Keywords:Mg alloy  electrochemical phosphating  corrosion resistance  current density  additive  electrochemical route
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号