首页 | 本学科首页   官方微博 | 高级检索  
     


Fabrication of a submicron patterned electrode using an electrospun single fiber as a shadow-mask
Authors:Yuya Ishii  Heisuke Sakai  Hideyuki Murata  
Affiliation:aSchool of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan
Abstract:We realize a uniform submicron-gap electrode by using an electrospun single fiber as a shadow-mask. By stretching an electrospun fiber, we can decrease the diameter of the fiber from 2 μm to 564 nm with its standard deviation of 57.7 nm. We place the fiber on the center of a Si/SiO2 substrate followed by the deposition of a molybdenum trioxide adhesion layer and Au electrode. After removing the fiber from the Si/SiO2 substrate, the submicron-gap gold electrode is formed. Characterization of the gap with scanning electron microscope revealed that the gap has a good uniformity; the average gap length is 865 nm throughout 2 mm gap width.
Keywords:Electrospinning  Submicron-gap patterned electrode  Single fiber  Shadow-mask
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号