Fabrication of a submicron patterned electrode using an electrospun single fiber as a shadow-mask |
| |
Authors: | Yuya Ishii Heisuke Sakai Hideyuki Murata |
| |
Affiliation: | aSchool of Materials Science, Japan Advanced Institute of Science and Technology (JAIST), 1-1 Asahidai, Nomi, Ishikawa 923-1292, Japan |
| |
Abstract: | We realize a uniform submicron-gap electrode by using an electrospun single fiber as a shadow-mask. By stretching an electrospun fiber, we can decrease the diameter of the fiber from 2 μm to 564 nm with its standard deviation of 57.7 nm. We place the fiber on the center of a Si/SiO2 substrate followed by the deposition of a molybdenum trioxide adhesion layer and Au electrode. After removing the fiber from the Si/SiO2 substrate, the submicron-gap gold electrode is formed. Characterization of the gap with scanning electron microscope revealed that the gap has a good uniformity; the average gap length is 865 nm throughout 2 mm gap width. |
| |
Keywords: | Electrospinning Submicron-gap patterned electrode Single fiber Shadow-mask |
本文献已被 ScienceDirect 等数据库收录! |