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Improving low pressure chemical vapor deposited zinc oxide contacts for thin film silicon solar cells by using rough glass substrates
Authors:J Steinhauser  J-F BoucherE Omnes  D BorrelloE Vallat-Sauvain  G MonteduroM Marmelo  J-B OrhanB Wolf  J BailatS Benagli  J MeierU Kroll
Affiliation:
  • Oerlikon Solar-Lab SA, Rue du Puits-Godet, 12a, CH-2000 Neuchâtel, Switzerland
  • Abstract:Compared to zinc oxide grown (ZnO) on flat glass, rough etched glass substrates decrease the sheet resistance (Rsq) of zinc oxide layers grown on it. We explain this Rsq reduction from a higher thickness and an improved electron mobility for ZnO layers deposited on rough etched glass substrates. When using this etched glass substrate, we also obtain a large variety of surface texture by changing the thickness of the ZnO layer grown on it. This new combination of etched glass and ZnO layer shows improved light trapping potential compared to ZnO films grown on flat glass. With this new approach, Micromorph thin film silicon tandem solar cells with high total current densities (sum of the top and bottom cell current density) of up to 26.8 mA cm− 2 were fabricated.
    Keywords:Transparent conductive oxide  TCO  Zinc oxide  ZnO  Solar cell  Light trapping
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