| 非晶态Ti—B—N薄膜的制备及晶化研究 |
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| 引用本文： | 李戈扬,王纪文.非晶态Ti—B—N薄膜的制备及晶化研究[J].材料工程,1998(10):19-21,29. |
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| 作者姓名： | 李戈扬 王纪文 |
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| 作者单位： | [1]上海交通大学金属基复合材料国家重点实验室 [2]上海交通大学高温材料及高温测试教育部开放 |
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| 摘 要： | 采用双靶轮流溅射技术，以Ｔｉ和六方氮化硼反应合成了Ｔｉ－Ｂ－Ｎ薄膜，并采用ＸＲＤ，ＴＥＭ和显微硬度计研究薄膜的微结构及其力学性能。结果表明，镀态Ｔｉ－Ｂ－Ｎ薄膜为非晶体Ｔｉ（Ｎ，Ｂ）化合物，其硬度达到ＨＫ２４７０；薄膜经过热处理晶化形成ＴｉＮ结构类型的Ｔｉ（Ｎ，Ｂ）晶体，硬度略有降低。
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| 关 键 词： | 多靶磁控溅射 晶化 钛－硼－氮 薄膜制备 |
Study on Synthesization and Crystallization of Amorphous Ti B N Thin Films |
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| Li Geyang,Wang Gongyao,Li Pengxing.Study on Synthesization and Crystallization of Amorphous Ti B N Thin Films[J].Journal of Materials Engineering,1998(10):19-21,29. |
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| Authors: | Li Geyang Wang Gongyao Li Pengxing |
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| Abstract: | Ti B N films were synthesized by alternative deposition of Ti and h BN through substrate rotation in multi target magnetron sputtering system The microstructure and mechanical properties of films were studied by XRD, TEM and microindentor It is shown that deposited Ti B N films exists as amorphous Ti(N,B) compound and the hardness reaches HK2470 After crystallization, Ti B N films consist of Ti(N, B)crystal existed in TiN like structure and the hardness decreases a little |
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| Keywords: | Ti B N films multi target magnetron sputtering crystallization |
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