| 化学气相沉积法制备超纳米金刚石薄膜 |
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| 引用本文： | 王玉乾,王兵,孟祥钦,甘孔银.化学气相沉积法制备超纳米金刚石薄膜[J].材料导报,2009,23(14). |
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| 作者姓名： | 王玉乾 王兵 孟祥钦 甘孔银 |
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| 作者单位： | 1. 西南科技大学材料学院,绵阳,621010
2. 中国工程物理研究院应用电子学研究所,绵阳,621900 |
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| 基金项目： | 国家自然科学基金，国家高技术研究发展计划(863计划) |
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| 摘 要： | 采用微波等离子体化学气相沉积法,利用CH4、SiO2和Ar的混合气体在单晶硅片基底上制备出高质量的超纳米金刚石薄膜.表征结果显示,制备的薄膜致密而均匀,晶粒平均尺寸约7.47nm,表面粗糙度约15.72nm,并且其金刚石相的物相纯度相对较高,是质量优异的超纳米金刚石薄膜材料.
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| 关 键 词： | 微波等离子体 化学气相沉积 超纳米金刚石薄膜 |
Preparation of Ultrananocrystalline Diamond Film by Chemical Vapor Deposition |
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| WANG Yuqian,WANG Bing,MENG Xiangqin,GAN Kongyin.Preparation of Ultrananocrystalline Diamond Film by Chemical Vapor Deposition[J].Materials Review,2009,23(14). |
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| Authors: | WANG Yuqian WANG Bing MENG Xiangqin GAN Kongyin |
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| Abstract: | High-quality ultrananocrystalline diamond film is prepared on single crystal Si with Ar,CH4 ,CO2 using microwave plasma chemical vapor deposition(MPCVD) technology. The results show that the high-quality thin film is compact and homogeneous, and its average crystalline grains and surface roughness are nearly 7. 47nm and 15.72nm, respectively. And the film aslo has a higher diamond phase purity. |
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| Keywords: | microwave plasma CVD ultrananocrystalline diamond film |
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