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二维纳米材料MXene的研究进展
引用本文:郑伟,孙正明,张培根,田无边,王英,张亚梅. 二维纳米材料MXene的研究进展[J]. 材料导报, 2017, 31(5). DOI: 10.11896/j.issn.1005-023X.2017.09.001
作者姓名:郑伟  孙正明  张培根  田无边  王英  张亚梅
作者单位:1. 东南大学材料科学与工程学院,南京,210000;2. 东南大学材料科学与工程学院,南京 210000;产业技术综合研究所(AIST),筑波305-8569
摘    要:MXene是一类新型碳/氮化物二维纳米层状材料,一般是利用化学刻蚀的手段通过选择性刻蚀掉前驱体MAX相中的A原子层而得到.其通式可表示为Mn+1XnTx,其中M代表早期过渡族金属,X代表碳和/或氮,Tx代表MXene在刻蚀过程中产生的附着在其表面的官能团(-OH、-F、=O、等).采用一定的手段将多层MXene剥落,可获得类石墨烯形貌的单层MXene.MXene除了具备传统二维材料的性能外,还兼具良好的导电性、亲水性、透光性、柔韧性以及能量储存性能,在复合材料、润滑剂、环境污染治理、电池、电容器、催化、传感器、抗菌等领域具有潜在的应用价值.文章总结了MXene的制备、结构、性能和应用等方面的最新成果,并展望了其今后的研究方向.

关 键 词:MAX相  MXene  二维材料  刻蚀  制备  应用

Research Progress on MXene,Two Dimensional Nano-materials
ZHENG Wei,SUN Zhengming,ZHANG Peigen,TIAN Wubian,WANG Ying,ZHANG Yamei. Research Progress on MXene,Two Dimensional Nano-materials[J]. Materials Review, 2017, 31(5). DOI: 10.11896/j.issn.1005-023X.2017.09.001
Authors:ZHENG Wei  SUN Zhengming  ZHANG Peigen  TIAN Wubian  WANG Ying  ZHANG Yamei
Abstract:MXene is a group of newly emerging two-dimensional (2-D) carbide/nitride materials, which are derived from its precursor MAX phase by selectively extracting A atoms from MX layers using chemical etching method.MXene can be denoted as Mn+1XnTx, where M is an early transition metal, X is carbon and/or nitrogen, and Tx represents surface termination groups (-OH,-F, =O) created in the etching progress.Single layered MXene exfoliated from multi-layered MXene resembles the morphology of graphene.Besides its merits of classical 2-D materials, MXene shows superior characteristics of high electrical conductivity, hydrophilia, transparency, flexibility and energy storage, which confer MXene on promising applications in composites, lubricant, environmental pollution abatement, batteries, capacitors, catalysts, sensors, antibacterial etc.This article presents the latest research results of the synthesis, structure, properties and potential applications for MXene, and research directions for MXene in the future are also predicted.
Keywords:MAX phase  MXene  two dimensional material  etching  preparation  application
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