含硅无氢非晶碳基薄膜的摩擦磨损性能

为了研究Si掺杂对无氢非晶碳基薄膜摩擦磨损性能的影响,利用直流磁控溅射技术在单晶硅和304不锈钢基底上沉积不同Si含量的无氢非晶碳基薄膜。采用SEM、Raman光谱、纳米压痕仪等分析手段对薄膜的成分、结构和力学性能进行表征。利用球盘式往复摩擦试验机测试薄膜在无润滑条件下的滑动摩擦磨损性能。结果表明:Si掺杂能降低薄膜内应力和促进sp3杂化,高于10%的Si原子导致薄膜硬度增加。在不同湿度条件下,Si掺杂并未明显影响溅射无氢非晶碳基薄膜的摩擦因数;相反,含Si薄膜在不同测试条件下都具有较高的磨损速率。薄膜磨损速率随相对湿度增加而减小,随Si含量增加而增加;高Si含量薄膜在低湿度条件下具有明显不稳定的摩擦因数和显著增加的磨损速率。这意味着在设计和发展性能优异的无氢非晶碳基摩擦学涂层时,应充分考虑Si掺杂导致的性能损失。

Friction and Wear Properties of Si-containing H-free Amorphous Carbon-based Films

To investigate the effect of Si incorporation on friction and wear properties of H-free amorphous carbon-based films, Si-containing H-free amorphous carbon films were deposited on Si and 304 stainless steel substrates by direct current magnetron sputtering method. The composition, structure and mechanical properties of the films were examined by scanning electron microscopy (SEM), Raman spectra, nanoindenter and other techniques. The tribological properties of the films were tested in dry contact conditions using a reciprocating sliding tribometer with ball-on-disk contact geometry. The results indicate that Si incorporation reduces the residual stress of films and promotes the sp³ hybridization. The film hardness is increased by Si incorporation over 10%. The addition of Si has little influence on friction coefficient of H-free carbon film under various wetting conditions. Si-doped films show higher wear rates than the H-free film, and their wear rates increase with increasing Si contents and decreasing relative humidity. High Si content within films causes significant instability of friction coefficient and leads to severe wear of the films in the low humid air. This suggests that the degradation in performance resulting from Si doping should be fully considered in designing and developing H-free amorphous carbon-based tribological coatings with excellent properties.