高功率脉冲磁控溅射制备金属氮化物涂层EI北大核心CSCD

高功率脉冲磁控溅射(HiPIMS)作为目前研究热门的物理气相沉积方法之一,已经在刀具材料、不锈钢、聚合物、复合材料等基体上实现硬质涂层、生物涂层、耐腐蚀涂层、耐高温氧化涂层、绝缘涂层等多种类型涂层制备。通过高功率脉冲磁控溅射与复合方法及后续热处理等工艺方法复合,调节高功率脉冲磁控溅射的脉冲频率、峰值功率、占空比、多脉冲和双极性实现对靶材离化率、等离子体空间分布、涂层沉积速率、相结构、微观结构、元素成分、内应力等等离子体参数和涂层物相结构的调整,以提高基体材料的硬度、耐磨损、耐腐蚀、耐高温氧化及生物相容性等综合使役性能。特别是在应用于金属氮化物涂层的制备及性能研究方面,具有巨大的工程应用价值。结合目前硬质涂层材料的应用现状,探讨高功率脉冲溅射技术沉积涂层的特性和技术优势,介绍20多年来高功率脉冲磁控溅射技术在制备单元单层、多元多层、纳米多层与多元复合、高熵合金及含Si、O、C等金属氮化物硬质涂层工艺及性能等方面应用的研究进展。

Application Research Progress of High Power Impulse Magnetron Sputtering in the Preparation of Metal Nitrides Coatings

As one of the most popular physical vapor deposition methods, high power impulse magnetron sputtering has been used for the preparation of hard coatings, biological coatings, corrosion-resistant coatings, high-temperature oxidation-resistant coatings, insulating coatings and other types of coatings on substrates such as tool materials, stainless steel, polymers, composite materials, etc. By high power impulse magnetron sputtering and combined method, subsequent heat treatment, the pulse frequency, peak power, duty cycle, multiple pulses and bipolarity of high power impulse magnetron sputtering to optimize and model the process to achieve the adjustment of plasma parameters such as target ionization, plasma spatial distribution, coating deposition rate, and coating phase structure such as phase structure, microstructure, element ratio, internal stress to improve the comprehensive application performance of the substrate material such as hardness, wear resistance, corrosion resistance, high temperature oxidation resistance and biocompatibility. In particular, HiPIMS has great engineering applications in the preparation and performance research of metal nitride coatings. In the context of the current application status of hard coating materials, the characteristics and technical advantages of coatings deposited by high power impulse sputtering technology are discussed. The research progress in the application of high power impulse magnetron sputtering technology such as processes in the preparation and performance of monolayers, multiple elements and multi-layers, nano-multilayers with multiple element composite, high entropy alloys and containing Si, O and C metal nitride hard coatings over the past more than 20 years are presented.