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中频磁控溅射沉积梯度过渡Cr/CrN/CrNC/CrC膜的附着性能
引用本文:牛仕超,余志明,代明江,林松盛,侯惠君,李洪武.中频磁控溅射沉积梯度过渡Cr/CrN/CrNC/CrC膜的附着性能[J].中国有色金属学报,2007,17(8):1307-1312.
作者姓名:牛仕超  余志明  代明江  林松盛  侯惠君  李洪武
作者单位:1. 中南大学,材料科学与工程学院,长沙,410083;广州有色金属研究院,材料表面工程研究所,广州,510651
2. 中南大学,材料科学与工程学院,长沙,410083
3. 广州有色金属研究院,材料表面工程研究所,广州,510651
摘    要:采用中频磁控溅射结合无灯丝离子源技术沉积梯度Cr/CrN/CrNC/CrC膜层,设计两组正交实验对膜层中界面Cr层及梯度层沉积的工艺参数对附着性能的影响进行研究。利用扫描电镜(SEM)、电子能谱(EDS)对其表面形貌及梯度成分进行表征;用划痕仪、显微硬度计及洛氏硬度计测评其附着性能,并对比两者测评的有效性。所得最优工艺参数为:梯度层沉积偏压100 V,中频功率6.5 kW,真空度0.6 Pa;Cr层的沉积时间、离子源电流及中频功率分别为2 min、4 A和6.5 kW。高中频功率及离子辅助沉积Cr层能有效提高膜层附着力。

关 键 词:中频磁控溅射  离子源  附着力
文章编号:1004-0609(2007)08-1307-06
收稿时间:2006-12-26
修稿时间:2006-12-262007-04-30

Adhesion of Cr/CrN/CrNC/CrC graded interlayer deposited by MF-magnetron sputtering
NIU Shi-chao,YU Zhi-ming,DAI Ming-jiang,LIN Song-sheng,HOU Hui-jun,LI Hong-wu.Adhesion of Cr/CrN/CrNC/CrC graded interlayer deposited by MF-magnetron sputtering[J].The Chinese Journal of Nonferrous Metals,2007,17(8):1307-1312.
Authors:NIU Shi-chao  YU Zhi-ming  DAI Ming-jiang  LIN Song-sheng  HOU Hui-jun  LI Hong-wu
Affiliation:1. School of Materials Science and Engineering, Central South University, Changsha 410083, China; 2. Guangzhou Research Institute of Nonferrous Metals, Guangzhou 510651, China
Abstract:The Cr/CrN/CrNC/CrC graded interlayer was deposited by MF-magnetron sputtering combined with ion source technique. Two orthogonal experiments were designed to study the relationship between adhesion and processing parameters both for Cr-interface and interlayer. Surface morphology and composition of graded interlayer were characterized by SEM and EDS. The results show that, the optimum deposition parameters for interlayer are -100 V bias voltages, 6.5 kW MF power under pressure of 0.5 Pa; the optimum deposition parameters for Cr layer are deposition time of 2 rain, ion resource current of 6 A and MF power of 6.5 kW. The deposition of Cr layer with high MF power and assistance of ion beam can improve the adhesion.
Keywords:CrC
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