磁流变微结构动压平面抛光试验研究

为提高集群磁流变平面抛光效率，在抛光盘表面增加微结构，以增强加工过程中的流体动压作用。使用平面抛光盘和表面加工有孔洞、V形槽、U形槽、矩形槽等不同微结构的抛光盘进行抛光试验及抛光压力特性试验，研究了加工间隙和工件转速对加工效果的影响。结果表明:抛光盘表面微结构对工件材料去除率影响较大，不同微结构盘材料去除率从大到小顺序为V形盘>U形盘>平面盘>孔洞盘>矩形盘，其中V形盘的材料去除率比平面盘高25%以上；所有抛光盘均能获得纳米级（R_a在8 nm以内）表面。当加工间隙为0.9~1.0 mm、工件转速为550 r/min时，加工效果较好。 

Experimental study on magnetorheological dynamic plane polishing with microstructure polishing disk

In order to improve the plane polishing efficiency of the cluster magnetorheological, some polishing disks with different microstructures were proposed to increase the hydrodynamic pressure of the plane polishing. Polishing experiments and polishing force characteristic experiments were carried out on the plane polishing disk and polishing disks with different microstructures such as holes, V-shaped grooves, U-shaped grooves and rectangular grooves on the surface. The influences of machining gap and workpiece rotation speed on the polishing effects were studied. The results show that the microstructures on the surface of the polishing disk have a great influence on the material removal rates of the workpiece. The material removal rates of the various disks are V-shaped disk>U-shaped disk>plane disk>hole-shaped disk>rectangular disk. The material removal rate of V-shaped disk is 25% greater than that of the plane disk. However, the disk structures have little effects on the surface roughnesses and all the polishing disks with different microstructures can obtain nano-scale (less than R_a 8 nm) surface. In this test, the better polishing effect can be obtained under the condition of the polishing gap 0.9-1.0 mm and the workpiece speed 550 r/min.