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纳米片状金刚石膜的生长过程
引用本文:姚宁,崔娜娜,鲁占灵,苏博,葛亚爽,安子凤,张兵临.纳米片状金刚石膜的生长过程[J].金刚石与磨料磨具工程,2011,31(6):16-19.
作者姓名:姚宁  崔娜娜  鲁占灵  苏博  葛亚爽  安子凤  张兵临
作者单位:1. 中国科学院安徽光学精密机械研究所,合肥230031;郑州大学物理工程学院材料物理教育部重点实验室,郑州450052
2. 郑州大学物理工程学院材料物理教育部重点实验室,郑州,450052
3. 郑州大学材料科学与工程学院,郑州,450052
基金项目:国家自然科学基金资助项目
摘    要:采用微波等离子化学气相沉积系统(MPCVD)在镀钛的单晶硅衬底上制备纳米金刚石薄膜。反应气体为CH4和H2,其流量比为1∶1,微波功率为1 800 W,反应气压为10 kPa。利用扫描电镜(SEM)和Raman光谱分析薄膜的形貌和碳结构。结果表明,纳米金刚石薄膜呈现片状的组织特征,其生长过程为:生长初期在单晶硅衬底上形成由纳米碳颗粒组成的球状碳团簇;随着沉积时间的增加,碳团簇逐渐增大,纳米碳颗粒定向排列或自组装,最终形成片状纳米金刚石膜。

关 键 词:纳米片状金刚石  生长过程  微波等离子化学气相沉积

Growth process of nanoflake diamond film
YAO Ning,CUI Na-na,LU Zhan-ling,SU Bo,GE Ya-shuang,AN Zi-feng,ZHANG Bing-lin.Growth process of nanoflake diamond film[J].Diamond & Abrasives Engineering,2011,31(6):16-19.
Authors:YAO Ning  CUI Na-na  LU Zhan-ling  SU Bo  GE Ya-shuang  AN Zi-feng  ZHANG Bing-lin
Affiliation:1.Anhui Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Hefei 230031,China)(2.Department of Physics and Key Laboratory of Material Physics of the Ministry of Education of China,Zhengzhou University,Zhengzhou 450052,China)(3.School of Materials Science and Engineering,Zhengzhou University,Zhengzhou 450052,China)
Abstract:Nanodiamond films were prepared by microwave plasma chemical vapor deposition system(MPCVD) on Ti-coated silicon substrate.The source gases were CH4 and H2,their flow rate was 1∶1.The microwave power was 1 800 W and the reaction pressure was 10 kPa.The microstructure and surface morphology of deposited films were characterized by Raman spectroscope and scanning electron microscope.The results showed that the nanodiamond film was flake textured.The growth process of the nanoflake diamond film could be briefly described as follows: initially spherical clusters composed of nanodiamond particles were formed on substrate,then the flaky texture appeared due to the direction arrangement or self-assembly of nanodiamond particles with the growth of clusters,finally formed the nanoflake diamond film.
Keywords:nanoflake-diamond  growth process  MPCVD
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