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同质外延单晶CVD金刚石的研究进展
引用本文:朱金凤,满卫东,吕继磊,匡巧,汪建华.同质外延单晶CVD金刚石的研究进展[J].金刚石与磨料磨具工程,2011,31(4):15-22.
作者姓名:朱金凤  满卫东  吕继磊  匡巧  汪建华
作者单位:武汉工程大学湖北省等离子体化学与新材料重点实验室,武汉,430073
基金项目:湖北省自然科学基金项目(2008CDB255); 湖北省教育厅优秀中青年人才项目(Q20081505)
摘    要:金刚石因具有诸多优异的物理化学性能而使其在很多领域都有非常广阔的应用前景.CVD法高速合成大面积、高质量单晶金刚石一直是人工合成金刚石的研究热点之一.本文首先从基底预处理、生长参数的优化以及合成工艺的改进这三个方面综述了MPCVD同质外延单晶金刚石的研究进展,其次对国内外CVD外延单晶金刚石的研究进展进行了简单的介绍,...

关 键 词:单晶金刚石  化学气相沉积  同质外延  生长速率

Progress of homoepitaxial CVD single-crystal diamond technology
Zhu Jinfeng,Man Weidong,Lv Jilei,Kuang Qiao,Wang Jianhua.Progress of homoepitaxial CVD single-crystal diamond technology[J].Diamond & Abrasives Engineering,2011,31(4):15-22.
Authors:Zhu Jinfeng  Man Weidong  Lv Jilei  Kuang Qiao  Wang Jianhua
Affiliation:Zhu Jinfeng Man Weidong Lv Jilei Kuang Qiao Wang Jianhua(Provincial Key Laboratory of Plasma Chemistry and Advanced Materials,Wuhan Institute of Technology,Wuhan 430073,China)
Abstract:Owing to its various excellent physical and chemical properties,diamond has great potential in many areas.Therefore,the synthesis of diamond,especially the synthesis of single crystal diamond of high quality and large area at high speed,has become a focus.This paper firstly reviews the development of homoepitaxial single crystal diamond synthesized by MPCVD(microwave plasma chemical vapor deposition) from the following three aspects,including substrate pretreatment,growth parameters optimization and the imp...
Keywords:single crystal diamond  chemical vapor deposition  homoepitaxial  growth rate  
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