采用旋转电极的金刚石表面镀镍方法及工艺

针对目前常用的固定电极滚镀法存在的镀覆效率低、镀层不均匀等问题，提出基于旋转电极的金刚石表面滚镀方法，并开发相应的滚镀装置。分析金刚石旋转电极滚镀法的镀覆机理，通过试验研究镀覆工艺参数对金刚石表面镀层沉积速率和镀层形貌的影响。结果表明:旋转电极可以驱动磨料堆增加其翻转频率和磨粒间的分散能力，提高磨粒堆与电极和镀液接触的均匀性，从而提高镀层的均匀性和表面质量。采用旋转电极滚镀法的最佳工艺参数为:镀覆电流为4 A，阴极转速为20 r/min，阴极转子直径为22.5 mm，金刚石粒度代号为70/80。增加磨粒堆的翻滚频率使磨粒间接触均匀性得到改善，增大滚镀空间和电极尺寸，进而增加单次镀覆的装载量。结果显示:采用旋转电极滚镀方法在2 L容量镀瓶中最大装载量可达700 g，约为相同条件下的固定电极装载量的2倍，显著提高了金刚石镀镍的生产效率。 

Nickel plating method and process on diamond surface with rotating electrode

Aiming at the problems of low plating efficiency and uneven coating in the current fixed electrode barrel plating method, a method of barrel plating on diamond surface based on rotating electrode was proposed, while the corresponding barrel plating device was developed. The mechanism of diamond rotary electrode barrel plating was analyzed, and the effects of plating parameters on deposition rate and morphology of diamond coating were studied by experiments. The results show that the rotating electrode can drive the abrasive stack to increase its overturning frequency and dispersing ability, and improve the contact uniformity between the abrasive stack with the electrode and plating solution, so as to improve the uniformity and surface quality of the coating. The results show that the best process parameters of rotating electrode barrel plating method are as follows: barrel plating current 4 A, cathode rotating speed 20 r/min, cathode rotor diameter 22.5 mm, grain size code of diamond 70/80. In addition, with the increase of rolling frequency of abrasive pile, the contact uniformity between abrasive particles is improved, which allows the increase of barrel plating space and electrode size, thus increasing the loading capacity of single plating. The results show that the maximum loading capacity of rotating electrode barrel plating method in 2 L capacity plating bottle can reach 700 g, which is about twice of the fixed electrode loading capacity under the same conditions, and the production efficiency is significantly improved.