Threshold of laser-activated writing of metal using microbe metabolite |
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Authors: | H Hocheng KE ChangJH Chang |
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Affiliation: | Department of Power Mechanical Engineering, National Tsing Hua University, Hsinchu 30010, Taiwan |
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Abstract: | A method of laser-activated deposition through the metabolite of Acidithiobacillus ferrooxidans is demonstrated. The experimental results indicate that the deposition process exhibits positive correlation to laser power and a negative correlation to scanning speed. The amount of deposition is related to the supplied energy per unit length of laser scanning. With respect to the thermal field on the substrate produced by a moving point source and a laser beam crossing a reference point, the temperature history and the accumulated energy are used to model the deposition process. The threshold temperature of the deposition is estimated 500 K, and the activation energy per unit volume of deposition of the process is about 120 pJ/μm3. |
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Keywords: | Laser Metal deposition Activation energy Microbe T ferrooxidans Metabolite |
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