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网状阴极法在碳钢表面沉积氮化钽薄膜的研究
引用本文:窦瑞芬,田林海,潘俊德,陈飞,赵晋香.网状阴极法在碳钢表面沉积氮化钽薄膜的研究[J].材料热处理学报,2002,23(2):58-61.
作者姓名:窦瑞芬  田林海  潘俊德  陈飞  赵晋香
作者单位:1. 太原理工大学表面工程研究所,山西太原,030024
2. 太原理工大学表面工程研究所,山西太原,030024;西安交通大学材料工程学院,陕西西安710074
基金项目:山西省青年基金资助项目 (991 0 2 0 )
摘    要:介绍了一种在钢铁基体上制备氮化钽薄膜的新方法———网状阴极法。其设备简单、价格低廉。实验中发现 ,在工艺参数调配合适的条件下 ,可制备出结构为面心立方和密排六方结构的氮化钽薄膜。薄膜较致密且均匀 ,与基体结合良好。分析了优选工艺参数条件下合成的氮化钽膜的成分、组织、表面和断口形貌及结合力。

关 键 词:网状阴极溅射  空心阴极效应  氮化钽薄膜
文章编号:1009-6264(2002)02-0058-04

Study of TaN Film Synthesized in Carbon Steel Substrate by the Net-Shape Cathode Sputtering Method
Dou Rui\|fen\ ,Tian Lin\|hai\ \{,\},Pan Jun\|de\ ,Chen Fei\ ,Zhao Jin\|xiang\.Study of TaN Film Synthesized in Carbon Steel Substrate by the Net-Shape Cathode Sputtering Method[J].Transactions of Materials and Heat Treatment,2002,23(2):58-61.
Authors:Dou Rui\|fen\  Tian Lin\|hai\ \{  \}  Pan Jun\|de\  Chen Fei\  Zhao Jin\|xiang\
Affiliation:Dou Rui\|fen\ 1,Tian Lin\|hai\ \{1,2\},Pan Jun\|de\ 1,Chen Fei\ 1,Zhao Jin\|xiang\ 1
Abstract:A new method, which synthesized tantalum nitride film by the net shape sputtering cathode has been introduced. It make tantalum source the net shape, which enforced to form the effect of hollow cathode. Ta\ is largely sputtered in the environment of glow discharge. If N\-2 is in flooded to the vacumm chamber,Ta\ combine with N\ ,then synthesized TaN film in the metal and Si substrate.By analyzing the structure,compositions,the surface and rapture morphology, and the adhesion strength of synthesized TaN thin film using XRD,AES,XPS and SEM, we found FCC TaN and HEX TaN film are formed in 20 steel and Si sheet. Meanwhile, there is formation of alloy layer between TaN film and steel substrate, which improved the adhesion strength of TaN film. The study manifest that the net shape cathode sputter can synthesized the optimum quality film of tantalum.
Keywords:the net  shape cathode sputter  the effect of hollow cathode  tantalum  nitride thin film
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