Roughness effect on the measurement of interface stress |
| |
| Affiliation: | 1. Metallurgy and Materials Engineering Group, Escuela Técnica Superior de Ingeniería, Universidad de Sevilla, Camino de los Descubrimientos, s/n, 41092, Sevilla, Spain;2. Department of Chemistry and Materials Science, Escuela Técnica Superior de Ingeniería, Universidad de Huelva, Campus La Rábida, Carretera Palos s/n, 21819, Palos de la Frontera, Huelva, Spain;1. Key Laboratory of Yunnan Province for Disaster Reduction in Civil Engineering, Faculty of Civil Engineering and Mechanics, Kunming University of Science and Technology, Kunming 650500, China;2. Le Mans Université, CNRS UMR 6613, LAUM, Avenue Olivier Messiaen, 72085 Le Mans Cedex 9, France;3. École Nationale Supérieure d''Ingénieurs du Mans, rue Aristote, 72085 Le Mans Cedex 9, France;4. Faculty of Science, Kunming University of Science and Technology, Kunming 650500, China |
| |
| Abstract: | Stimulated by a recent paper by Spaepen (Acta mater. 48 (2000) 31) we concentrate on the effect of roughness parameters on stress measurements in thin films for self-affine and mound rough interfaces. A self-affine interface is characterized by a lateral correlation length ξ, an rms roughness amplitude σ, and a roughness exponent H (0<H<1). With increasing long wavelength roughness ratio σ/ξ, the ratio between the measured and the actual interface stress decreases. It decreases with a decreasing roughness exponent H that leads to rougher interfaces at short roughness wavelengths (<ξ). For mound roughness which is characterised besides σ by an average mound separation λ and a system correlation length ζ, the force ratio decays in an oscillatory manner as a function of σ/λ as long as λ<ζ. It is concluded that for both cases a more precise knowledge of roughness morphology is required in order to address the influence of interface roughness on the interface stress in thin films. |
| |
| Keywords: | |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
