| 基于Taguchi方法的钼栅网微细光刻电解试验研究 |
| |
| 引用本文： | 何铁军,汪炜,冯海娣,刘正埙.基于Taguchi方法的钼栅网微细光刻电解试验研究[J].电加工与模具,2011(1):11-14. |
| |
| 作者姓名： | 何铁军 汪炜 冯海娣 刘正埙 |
| |
| 作者单位： | 南京航空航天大学机电学院; |
| |
| 摘 要： | 影响钼栅网电解加工尺寸均一性的因素有电解液浓度、电流密度、阴极直径以及极间间隙等.利用Taguchi方法对这些因素进行综合分析及试验验证,阴极直径和极间间隙作用显著.通过ANSYS软件对电解过程中的电场进行分析,得出了阴极直径和极间间隙大小的改变对阳极表面电场的影响规律.在此基础上,采用酸性活化电解液对钼栅网进行微细光...
|
| 关 键 词： | 光刻电解 Taguchi方法 电场分析 钼栅网 |
Study of Electrochemical Micromachining on Molybdenum Grid based on Taguchi Methods |
| |
| He Tiejun,Wang Wei,Feng Haidi,Liu Zhengxun.Study of Electrochemical Micromachining on Molybdenum Grid based on Taguchi Methods[J].Electromachining & Mould,2011(1):11-14. |
| |
| Authors: | He Tiejun Wang Wei Feng Haidi Liu Zhengxun |
| |
| Affiliation: | He Tiejun,Wang Wei,Feng Haidi,Liu Zhengxun(Nanjing University of Aeronautics & Astronautics,Nanjing 210016,China) |
| |
| Abstract: | Electrolyte concentration,current density,design of cathode and interelectrode gap are the main factors of electrolytic photo etching process,especially for achieving the dimensional uniformity of molybdenum grids.In this paper,the Taguchi method is introduced to establish analytical and experimental procedure.It is demonstrated that the diameter of cathode and interelectrode gap are more remarkable amongst those influence factors,and the discipline of the electric field of interelectrode gap is analyzed by... |
| |
| Keywords: | electrolytic photo etching Taguchi method analysis of electric field molybdenum grid |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
|
