化学气相沉积钨涂层的研究现状与进展

化学气相沉积钨涂层具有工艺简单、技术成熟度高、涂层综合质量优异等特点，广泛应用于国防、航天、核工业等领域。首先介绍了化学气相沉积钨涂层的原理和特点，重点讨论了化学气相沉积钨涂层的工艺及应用研究现状，包括化学气相沉积钨涂层微观组织控制工艺及在耐辐射、耐磨耐蚀和高温防护领域的应用，同时对新型化学气相沉积钨涂层技术的发展进行了展望。一是改善现有工艺存在的反应气源与反应产物毒性大等问题，满足绿色环保的发展要求；二是改善现有工艺存在的沉积温度高、沉积速率偏低等问题，实现在不同衬底表面的高效、高质量沉积；三是改善现有化学气相沉积钨涂层结构与功能单一等问题，满足构件对钨涂层高性能和多功能的需求。

Research Status and Development of Chemical Vapor Deposition Tungsten Coating

Tungsten coating by chemical vapor deposition has the characteristics of simple process, high technological maturity, and excellent overall quality and is widely used in the fields of national defense, aerospace and nuclear industry. The principles and characteristics of chemical vapor deposition tungsten coating were introduced firstly and the research status of process and application of chemical vapor deposition tungsten coating was analyzed emphatically, including the microstructure control process and the application in the fields of radiation resistance, abrasion and corrosion resistance and high temperature protection. At the same time, the development of new chemical vapor deposition tungsten coating technology was prospected. The first is to solve the problems of the existing process that the reaction gas source and the reaction product have high toxicity, and to meet the development requirements of green environmental protection. The second is to solve the problems of high deposition temperature, low deposition rate, etc., so that the deposition high-efficiency and high-quality can be achieved on different substrates surface. The third is to solve the problems that the existing chemical vapor deposition tungsten coating only has a single structure and function, to meet the requirements of components for high performance and multi-function of tungsten coating.