磁控溅射MoS2-Ni复合膜的结构与性能研究

目的提高MoS_2薄膜在大气环境下的摩擦学性能。方法采用离子源复合磁控溅射技术制备了Mo S2-Ni复合膜,通过改变Ni靶功率获得不同Ni掺杂量的复合膜,研究不同Ni掺杂量对复合膜结构及摩擦学性能的影响。采用扫描电镜(SEM)、X射线衍射仪(XRD)、显微硬度计、洛氏硬度计、球-盘式摩擦磨损试验机以及3D轮廓仪,对复合膜显微结构和性能进行研究。结果复合膜以柱状晶结构生长,增加Ni含量可以细化晶粒,使复合膜的结构更加致密。复合膜硬度在250~446HV之间,且随Ni含量的增加,复合膜的硬度提高。复合膜具有良好的膜/基结合力,结合力达到HF1级。MoS_2-Ni复合膜的摩擦系数在0.10~0.23之间,随Ni含量的增加,虽然复合膜的摩擦系数增加,但由于磨损过程形成稳定的转移膜粘着在对磨球表面,因而使得磨损率降低,耐磨寿命提高。结论 Ni掺杂可以提高复合膜的致密度、硬度以及结合力,增强复合膜的耐磨性能。

Structure and Properties of MoS2-Ni Composite Films Fabricated by Magnetron Sputtering Method

The work aims to improve tribological properties of MoS2 film in atmosphere. MoS2-Ni composite films were fabricated in magnetron sputtering method combined with ion source. Composite films with different Ni doping contents were obtained by changing Ni target power. The effects of Ni doping content on structure and tribological properties of the composite films were studied. Microstructure and properties of the composite films were studied by using scanning electron microscope (SEM), X-ray diffractometer (XRD), microhardness tester, Rockwell hardness tester, ball-on-disc wear tester and 3D profiler. The composite films exhibited columnar crystal structure. Grains were refined and the structure was compacted as the Ni content increased. Hardness of the composite films ranged between 250~446HV and it increased as the Ni content increased. The composite films exhibited good film/substrate binding force, which might reach grade HF1. Friction coefficient of the MoS2-Ni composite films ranged between 0.10~0.23. As the Ni content increased, the wear rate reduced and friction durability increased as stable transfer film formed and stuck to the grinding ball though the friction coefficient increased. Ni doping can improve density of composite films, thus enhancing hardness, adhesion and wear resistance of the composite films.