类富勒烯薄膜的载荷依赖摩擦滞后行为研究

目的研究类富勒烯薄膜(FL-C:H)的载荷相关性摩擦滞后行为。方法采用直流等离子体化学气相沉积技术(DC-PECVD)在硅基底上制备了FL-C:H薄膜,通过场发射扫描电镜(FE-SEM)、X射线光电子能谱(XPS)、高分辨透射电镜(HRTEM)和拉曼光谱仪分别表征了薄膜的厚度、元素结合能状态以及微观结构,利用纳米压痕仪测定了薄膜的硬度及弹性恢复,借助往复摩擦磨损试验机考察了不同频率时变载荷条件下的摩擦滞后行为。结果以CH4和H2为前躯体制备的FL-C:H薄膜具有良好的机械性能,硬度和弹性模量分别为23.42 GPa和162.27 GPa,弹性恢复高达~82%。所制备薄膜与GCr15球配偶摩擦时,表现出良好的摩擦学性能,在循环载荷条件下表现出摩擦滞后行为。结论 FL-C:H薄膜在循环载荷条件下的摩擦滞后现象与所对应的频率有关。主要是由于大气环境下,摩擦界面处H2O、O2吸附造成氧化反应和磨损的共同作用。

Load-dependent Friction Hysteretic Behaviors of Fullerene-like Films

The work aims to investigate the load-dependent friction hysteretic behavior of fullerene-like films (FL-C:H). The FL-C:H films were prepared on silicon substrate by direct current plasma enhanced chemical vapor deposition (DC-PECVD) technique. Field emission scanning electron microscopy (FE-SEM), X-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and Raman spectroscopy were used to characterize the film thickness, element binding energy state and microstructure, respectively. The mechanical properties (hardness and elastic recovery) and friction hysteretic behaviors of the films were investigated with a Nano-indenter and a reciprocating friction and wear tester at different frequencies under the changing loads. Results showed that the FL-C:H films prepared with CH4 and H2 as the precursor had good mechanical properties, with the hardness and elastic modulus up to 23.42 GPa and 162.27 GPa, respectively. The elastic recovery was as high as ~82%. Furthermore, for friction with the GCr15 ball as a dual, the FL-C:H films showed good tribological properties, and there was friction hysteretic phenomenon under the cyclic loading. The friction hysteretic phenomenon of the FL-C:H films under the cyclic loading is related to the corresponding frequency. The main reason for this phenomenon is the synergistic effect of oxidation reaction and wear caused by the adsorption of H2O and O2 at the frictional interface in the atmospheric environment.