| 脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响 |
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| 引用本文： | 魏永强,张艳霞,文振华,蒋强,冯宪章.脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响[J].表面技术,2014,43(1):1-6,39. |
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| 作者姓名： | 魏永强 张艳霞 文振华 蒋强 冯宪章 |
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| 作者单位： | 郑州航空工业管理学院 机电工程学院, 郑州 450015;航空制造及装备河南省高校工程技术研究中心, 郑州 450015;郑州信息科技职业学院 机电工程系, 郑州 450015;郑航空工业管理学院 机电工程学院, 郑州 450015;航空制造及装备河南省高校工程技术研究中心, 郑州 450015;郑州航工业管理学院 机电工程学院, 郑州 450015;航空制造及装备河南省高校工程技术研究中心, 郑州 450015;郑州航工业管理学院 机电工程学院, 郑州 450015;航空制造及装备河南省高校工程技术研究中心, 郑州 450015 |
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| 基金项目： | 国家自然科学基金(51105344) ;航空科学基金(2012ZE55011) ;河南省教育厅科学技术研究重点项目( 13A430397,14A140026 ) ;河南省科技厅基础与前沿技术研究计划 ( 132300410241 ) ; 河南省高校科技创新团队支持计划( 2012IRTSTHN014 ) ; 郑州航院科研创新团队建设项目(2014TD01) |
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| 摘 要： | 目的研究脉冲偏压占空比对TiN/TiAlN多层薄膜微观结构和硬度的影响规律。方法利用脉冲偏压电弧离子镀的方法,改变脉冲偏压占空比,在M2高速钢表面制备5种TiN/TiAlN多层薄膜,对比研究了薄膜的微观结构、元素成分、相结构和硬度的变化规律。结果 TiN/TiAlN多层薄膜表面出现了电弧离子镀制备薄膜的典型生长形貌,随着脉冲偏压占空比的增加,薄膜表面的大颗粒数目明显减少。此外,脉冲偏压占空比的增加还引起多层薄膜中Al/Ti原子比的降低。结论 TiN/TiAlN多层薄膜主要以(111)晶面择优取向生长,此外还含有(311),(222)和(200)晶相结构。5种多层薄膜的纳米硬度均在33GPa以上,当脉冲偏压占空比为20%时,可实现超硬薄膜的制备。
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| 关 键 词： | TiN/TiAlN 电弧离子镀 纳米硬度 微观结构 脉冲偏压占空比 |
| 收稿时间： | 2013/10/22 0:00:00 |
| 修稿时间： | 2013/11/22 0:00:00 |
Effects of Different Pulsed Bias Duty Cycle on the Microstructure and Hardness of TiN / TiAlN Multilayer Coatings |
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| WEI Yong-qiang,ZHANG Yan-xi,WEN Zhen-hu,JING Zhi-qiang and FEN Xian-zhang.Effects of Different Pulsed Bias Duty Cycle on the Microstructure and Hardness of TiN / TiAlN Multilayer Coatings[J].Surface Technology,2014,43(1):1-6,39. |
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| Authors: | WEI Yong-qiang ZHANG Yan-xi WEN Zhen-hu JING Zhi-qiang and FEN Xian-zhang |
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| Affiliation: | Scool of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China;School of Mechatronics Engineering, Zhengzhou Vocational University of Information and Technology, Zhengzhou 450015, China;Scool of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China;Schol of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China;Schol of Mechatronics Engineering, Zhengzhou Institute of Aeronautical Industry Management, Zhengzhou 450015, China;Engineering Technology Research Center of Aviation Manufacturing & Equipment, University of Henan Province, Zhengzhou 50015, China |
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| Abstract: | Objective To study the effects of pulsed bias duty cycle on the microstructure and hardness of TiN / TiAlN multilayer coatings. Methods Five TiN / TiAlN multilayer coatings with different pulsed bias duty cycle were deposited by the pulse biased arc ion plating method on M2 high speed steel substrates, and the microstructure, composition, phase structure and hardness of the multilayer coatings were investigated. Results TiN / TiAlN multilayer coatings surface exhibited a typical growth morphology prepared by arc ion plating. The amount of macroparticles was significantly reduced with increasing pulsed bias duty cycle. The increase of pulsed bias duty cycle also caused the decrease of Al / Ti atomic ratio in the multilayer coatings. Conlusion TiN / TiAlN multilayer coatings preferred (111) orientation growth, and meanwhile contained (311) , (222) and (200) crystallographic structure. The nanohardness of five multilayer coatings was higher than 33 GPa. At 20% pulsed bias duty cycle, the super hard coatings were prepared. |
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| Keywords: | TiN/TiAlN arc ion plating nanohardness microstructure pulsed bias duty cycle |
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