| 用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率 |
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| 引用本文： | 印仁和,曹为民,李亚君,李卓棠,荣国斌.用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率[J].金属学报,1997,33(6):667-672. |
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| 作者姓名： | 印仁和 曹为民 李亚君 李卓棠 荣国斌 |
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| 作者单位： | [1]上海大学 [2]华东理工大学 |
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| 基金项目： | 国家自然科学基金!59471060 |
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| 摘 要： | 用临界钝化电流法和液晶法，研究了不锈钢上Ｔａ２Ｏ５，ＺｒＯ２的高频溅射膜的缺陷率，建立了ＣＰＣＤ法中与薄膜有关的电流密度Ｉｆ与膜厚ｄ之间的关系式：Ｉｆ＝ｋ（１－θ）＾ｄ，利用液晶的动态散射模型建立了动态无损伤检测膜缺陷率的新方法，并证明了这两种方法的检测结果有良好的直线关系。
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| 关 键 词： | 临界钝化电流法 液晶法 氧化物 薄膜 缺陷率 |
| 收稿时间： | 1997-06-18 |
| 修稿时间： | 1997-06-18 |
THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS |
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| YIN Renhe,CAO Weimin,LI Yajun LI Zhuotang RONG Guobin.THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS[J].Acta Metallurgica Sinica,1997,33(6):667-672. |
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| Authors: | YIN Renhe CAO Weimin LI Yajun LI Zhuotang RONG Guobin |
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| Affiliation: | YIN Renhe,CAO Weimin,LI Yajun(The Electrochemical Research Center,ShanghaiUniversity,Shanghai ) LI Zhuotang (Deportment of Materials,Shanghai University)) RONG Guobin (East China University of Science and Technology) |
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| Abstract: | The defects in Ta2O5 and ZrO2 films prepared by RF sputtering on SUS304stainless steel were studied by CPCD (critical passivation current density) and liquid crystalmethods. In CPCD method a relation between current density if and film thickness wasgiven: If= K(1-0)d. Using DSM (dynamic scattering mode) of liquid crystal, a new methodabout nondestructive testing of film defects was reported. The results of the two methodsshowed a good linear relation. |
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| Keywords: | CPCD method DSM liquid crystal oxide film defect |
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