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Cu/X(X=Cr,Nb)纳米多层膜力/电学性能的尺度依赖性
引用本文:张金钰,张欣,牛佳佳,刘刚,张国君,孙军. Cu/X(X=Cr,Nb)纳米多层膜力/电学性能的尺度依赖性[J]. 金属学报, 2011, 0(10)
作者姓名:张金钰  张欣  牛佳佳  刘刚  张国君  孙军
作者单位:西安交通大学金属材料强度国家重点实验室;
基金项目:国家重点基础研究发展计划项目2010CB631003; 国家自然科学基金项目50971097资助~~
摘    要:利用纳米压痕实验以及四探针法,系统研究了相同层厚Cu/X(X=Cr,Nb)纳米金属多层膜的力学性能(强/硬度)和电学性能(电阻率)的尺度依赖性.微观分析表明:Cu/X多层膜调制结构清晰,Cu层沿{111}面择优生长,X层沿{110}面择优生长.纳米压入结果表明,Cu/X多层膜的强度依赖于调制周期,并随调制周期的减小而增加.多层膜变形机制在临界调制周期(λ~c≈25 nm)由Cu层内单根位错滑移转变为位错切割界面.多层膜的电阻率不仅与表面/界面以及晶界散射相关,而且在小尺度下受界面条件显著影响.通过修正的FS-MS模型可以量化界面效应对多层膜电阻率的影响.Cu/X纳米多层膜可以通过调控微观结构实现强度-电导率的合理匹配.

关 键 词:Cu/Cr  Cu/Nb  纳米多层膜  强度  电阻率  尺寸效应  

LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X(X=Cr,Nb) NANOSTRUCTURED METALLIC MULTILAYERS
ZHANG Jinyu,ZHANG Xin,NIU Jiajia,LIU Gang,ZHANG Guojun,SUN Jun State Key Laboratory for Mechanical Behavior of Materials,Xi'an Jiaotong University,Xi'an. LENGTH SCALE DEPENDENT MECHANICAL/ELECTRICAL PROPERTIES OF Cu/X(X=Cr,Nb) NANOSTRUCTURED METALLIC MULTILAYERS[J]. Acta Metallurgica Sinica, 2011, 0(10)
Authors:ZHANG Jinyu  ZHANG Xin  NIU Jiajia  LIU Gang  ZHANG Guojun  SUN Jun State Key Laboratory for Mechanical Behavior of Materials  Xi'an Jiaotong University  Xi'an
Affiliation:ZHANG Jinyu,ZHANG Xin,NIU Jiajia,LIU Gang,ZHANG Guojun,SUN Jun State Key Laboratory for Mechanical Behavior of Materials,Xi'an Jiaotong University,Xi'an 710049
Abstract:By using nanoindentation test and four point probe method,the length scaled dependent mechanical property(hardness/strength) and electrical property(resistivity) of Cu/X(X=Cr, Nb) nanostructured metallic multilayers with equal individual layer thickness were systematically investigated. It is revealed from the microstructural analysis that the modulation structure of Cu/X metallic multilayers is clear,and the preferred growth planes of Cu layer and X layer are {111} and {110},respectively.The indentation te...
Keywords:Cu/Cr  Cu/Nb  nanostructured multilayer  strength  resistivity  size effect  
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