| 脉冲电沉积时间对纳米晶镍镀层微观结构和性能的影响 |
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| 引用本文： | 戴玉明,张振忠,巴志新,赵芳霞,周剑秋.脉冲电沉积时间对纳米晶镍镀层微观结构和性能的影响[J].金属热处理,2009,34(10). |
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| 作者姓名： | 戴玉明 张振忠 巴志新 赵芳霞 周剑秋 |
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| 作者单位： | 1. 南京工业大学,材料科学与工程学院,江苏,南京,210009;南京工程学院,材料工程学院,江苏,南京,211167
2. 南京工业大学,材料科学与工程学院,江苏,南京,210009 |
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| 基金项目： | 国家自然科学基金(10502025,10872087);;江苏省高校自然科学基金(05KJB1300421) |
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| 摘 要： | 采用脉冲电沉积法制备纳米晶镍镀层,利用扫描电镜、能谱仪、X射线衍射仪及显微硬度计对不同电沉积时间下制得的镍镀层的显微组织、微区成分、结构及力学性能进行表征分析。结果表明,不同电沉积时间下制得的镍镀层晶粒尺寸在21 nm小幅波动;随着电沉积时间的延长,纳米晶镍镀层的显微硬度存在先增大后缓慢降低的趋势,最大值为472 HV0.01,对应的电沉积时间为16 m in;纳米晶镍镀层的微观形貌为累积长大的胞状结构,电沉积时间为1~4 m in时,胞状结构表面密布着粒径为90 nm左右的二次纳米镍颗粒;本试验制得的纳米晶镍镀层失稳长大的起始温度为283.7℃,峰值温度为311.4℃。
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| 关 键 词： | 脉冲电沉积 纳米晶 镍 电沉积时间 显微组织 |
Influences of pulse electrodeposition time on microstructure and performance of nanocrystaIline nickel plating |
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| DAI Yu-ming,ZHANG Zhen-zhong,BA Zhi-xin,ZHAO Fang-xia,ZHOU Jian-qiu.Influences of pulse electrodeposition time on microstructure and performance of nanocrystaIline nickel plating[J].Heat Treatment of Metals,2009,34(10). |
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| Authors: | DAI Yu-ming ZHANG Zhen-zhong BA Zhi-xin ZHAO Fang-xia ZHOU Jian-qiu |
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| Affiliation: | 1.College of Material Science and Engineering;Nanjing University of Technology;Nanjing Jiangsu 210009;China;2.College of Materials Engineering;Nanjing Institute of Technology;Nanjing Jiangsu 211167;China |
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| Abstract: | Nanocrystalline nickel plating was prepared by pulse electrodeposition method.The microstructure,microarea composition,structure and mechanical properties of nanocrystalline nickel platings under differernt electrodeposition time were characterized and analyzed with SEM,EDS,XRD and microhardness tester.The results show that the grain sizes of nickel platings prepared under different electrodeposition time slightly fluctuate at 21 nm.The microhardness values of nickel platings first increase and then slowly ... |
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| Keywords: | pulse electrodeposition nanocrystalline nickel electrodeposition time microstructure |
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