多重空心阴极溅射靶及其应用

研制了一种由多个空极并列组合而成的可直接作为溅射靶的多重空心阴极溅射靶。其溅射输出量可用靶电压、气压及空心阴极的高度和宽度的比值控制。多重空心阴极溅射靶应用于双辉离子金属渗镀试验。结果表明，这种方法可以加速金属渗镀层的形成。在靶电流密度较大的条件下，可以形成合金扩散层和纯金属沉积层的复合层组织。

Research of Multiple Hollow Cathode Sputtering Target and Its Application

:A new multiple hollow cathode sputtering target which has a simple structure and a high sputtering rate,was put forward.The sputtering rate can be controlled by changing target valtage,pressure and H/D. The result shows that this method has a high surface alloying and deposition rate,and the multiple structure made of alloying and coating layers can be formed,in double glow suface alloying process.