Cu/Ni多层膜对Ti811合金微动磨损和微动疲劳抗力的影响

在Ti811钛合金表面利用离子辅助磁控溅射沉积技术制备20～1200nm不同调制周期的Cu/Ni金属多层膜,分析多层膜的结构,测试膜基结合强度、膜层显微硬度和韧性,对比研究不同调制周期的Cu/Ni多层膜对钛合金基材常温下微动磨损性能和微动疲劳(FF)抗力的影响。结果表明:利用离子辅助磁控溅射技术可以获得致密度高、晶粒细化、膜基结合强度高的Cu/Ni多层膜,该类多层膜具有良好的减摩润滑作用,因而改善了Ti811钛合金常温下抗微动磨损和微动疲劳性能;Cu/Ni多层膜对钛合金FF抗力的改善程度随膜层调制周期呈现非单调变化趋势,调制周期为200nm的Cu/Ni多层膜对钛合金FF抗力的提高程度最大,原因归于该膜层具有良好的强韧和润滑综合性能。

Effects of Cu/Ni Multilayer Film on Fretting Wear and Fretting Fatigue Resistance of Ti811 Alloys

The Cu/Ni multilayer films with modulation period thickness of 20-1200 nm were prepared on Ti811 titanium alloy surface by ion assisted magnetron sputtering deposition (IAD) technique. The structure, bonding strength, micro-hardness and ductility of the films were analyzed. The effects of the Cu/Ni multilayer films with different modulation periods on the fretting wear (FW) property and fretting fatigue (FF) resistance of the titanium alloy substrate at room temperature were investigated. The results indicate that the IAD technique can prepare Cu/Ni multilayer films with high density, small grain size, high bonding strength and excellent lubricating properties. Therefore, the Cu/Ni multilayer films could improve the resistance of fretting wear and fretting fatigue of the Ti811 alloy at room temperature. The FF resistance of the titanium alloy substrate is increased non-monotonously with increasing of the modulation period thickness of the Cu/Ni multilayer films. The Cu/Ni multilayer films with modulation period thickness of 200 nm have the highest FF resistance among the prepared Cu/Ni multilayer films for its comprehensive properties with high toughness, high strength and good lubricating action.