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Stability of the Third Generation Intensifier under Illumination
作者姓名:杜晓晴  杜玉杰  常本康
作者单位:InstituteofElectronicEngineeringandOptoelectronicsTechnology,NanjingUniversityofScienceandTechnology,NanjingJiangsu210094,China
摘    要:The stability under illumination of transmission-mode GaAs photocathode sealed in the third generation intensifier is investigated by use of spectral response testing instruments. The variations of spectral response with the illumination times under weak and intense illumination are compared. The variations of photoemission performance parameters are also characterized. The results show that during initial several weak illuminations photocathode behaves no evident decay and a maximum sensitivity is achieved, while under intense illumination the sensitivity of photocathode begin to decrease largely at the first illumination. The calculated performance parameters show that the variation of surface escape probability with illumination times is a direct cause of instability of photocathode. It is also found that under intense illumination peak wavelength is moved towards short-wave and peak response is decreased, which shows that the ability of long-wave response of photocathode is decreased.

关 键 词:砷化镓光电阴极  光谱响应  稳定性  逃脱概率

Stability of the Third Generation Intensifier under Illumination
DU Xiao-qing,DU Yu-jie,CHANG Ben-kang.Stability of the Third Generation Intensifier under Illumination[J].Journal of China Ordnance,2005,1(1):73-76.
Authors:DU Xiao-qing  DU Yu-jie  CHANG Ben-kang
Abstract:The stability under illumination of transmission-mode GaAs photocathode sealed in the third generation intensi-fier is investigated by use of spectral response testing instruments. The variations of spectral response with the illumination times under weak and intense illumination are compared. The variations of photoemission performance parameters are also characterized. The results show that during initial several weak illuminations photocathode behaves no evident decay and a maximum sensitivity is achieved, while under intense illumination the sensitivity of photocathode begin to decrease largely at the first illumination. The calculated performance parameters show that the variation of surface escape probability with illumination times is a direct cause of instability of photocathode. It is also found that under intense illumination peak wavelength is moved towards short-wave and peak response is decreased, which shows that the ability of long-wave response of photocathode is decreased.
Keywords:GaAs photocathode  spectral response  stability  escape probability  Illumination  Generation  escape probability  peak  response  variation  surface  direct  cause  instability  decrease  results  show  during  initial  photocathode  decay  maximum  sensitivity  photoemission
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